Rapid Determination of Apparent Activation Energies in Chemical Vapor Deposition

G. Leyendecker; H. Noll; D. Bäuerle; P. Geittner; H. Lydtin

doi:10.1149/1.2119645

Rapid Determination of Apparent Activation Energies in Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.2119645 ◽

1983 ◽

Vol 130 (1) ◽

pp. 157-160 ◽

Cited By ~ 31

Author(s):

G. Leyendecker ◽

H. Noll ◽

D. Bäuerle ◽

P. Geittner ◽

H. Lydtin

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Rapid Determination ◽

Chemical Vapor ◽

Activation Energies ◽

Apparent Activation Energies

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Numerical study of apparent activation energies of diamond growth rates in hot filament chemical vapor deposition systems

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.580304 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1604-1608 ◽

Cited By ~ 10

Author(s):

Frank Behrendt ◽

Olaf Deutschmann ◽

Bernhard Ruf ◽

Jürgen Warnatz

Keyword(s):

Chemical Vapor Deposition ◽

Growth Rates ◽

Vapor Deposition ◽

Numerical Study ◽

Chemical Vapor ◽

Activation Energies ◽

Diamond Growth ◽

Apparent Activation Energies ◽

Hot Filament

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Determination of activation energies for diamond growth by an advanced hot filament chemical vapor deposition method

Applied Physics Letters ◽

10.1063/1.105417 ◽

1991 ◽

Vol 59 (4) ◽

pp. 488-490 ◽

Cited By ~ 59

Author(s):

Eiichi Kondoh ◽

Tomohiro Ohta ◽

Tohru Mitomo ◽

Kennich Ohtsuka

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Activation Energies ◽

Diamond Growth ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Hot Filament

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Interferometer sensor for determination of plasma enhanced chemical vapor deposition characteristics

Proceedings of the Thirteenth Biennial University/Government/Industry Microelectronics Symposium (Cat. No.99CH36301) ◽

10.1109/ugim.1999.782857 ◽

2003 ◽

Author(s):

D.R. Wirth ◽

L. Caraway ◽

T.J. Sanders

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor

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Persistent photoconductivity on ion irradiated carbon films prepared by plasma assisted chemical vapor deposition and determination of traps in the pseudo‐gap region

Applied Physics Letters ◽

10.1063/1.115590 ◽

1996 ◽

Vol 68 (15) ◽

pp. 2079-2081 ◽

Cited By ~ 1

Author(s):

Somnath Bhattacharyya ◽

K. S. R. Koteswara Rao ◽

S. V. Subramanyam ◽

D. Kanjilal

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Persistent Photoconductivity

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Longer Nanotubes at Lower Temperatures: The Influence of Effective Activation Energies on Carbon Nanotube Growth by Thermal Chemical Vapor Deposition†

The Journal of Physical Chemistry C ◽

10.1021/jp071079y ◽

2007 ◽

Vol 111 (48) ◽

pp. 17705-17712 ◽

Cited By ~ 36

Author(s):

Michael J. Bronikowski

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Nanotube ◽

Vapor Deposition ◽

Chemical Vapor ◽

Activation Energies ◽

Effective Activation ◽

Thermal Chemical Vapor Deposition ◽

Carbon Nanotube Growth ◽

Nanotube Growth

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A novel 3D porous graphene foam prepared by chemical vapor deposition using nickel nanoparticles: Electrochemical determination of levodopa in the presence of uric acid

Microchemical Journal ◽

10.1016/j.microc.2019.02.067 ◽

2019 ◽

Vol 147 ◽

pp. 163-169 ◽

Cited By ~ 7

Author(s):

Zhao Wang ◽

Hong Yan Yue ◽

Ze Min Yu ◽

Shuo Huang ◽

Xin Gao ◽

...

Keyword(s):

Uric Acid ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Nickel Nanoparticles ◽

Chemical Vapor ◽

Electrochemical Determination ◽

Graphene Foam ◽

Porous Graphene

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Materials growth and band offset determination of Al2O3/In0.15Ga0.85Sb/GaSb/GaAs heterostructure grown by metalorganic chemical vapor deposition

Applied Physics Letters ◽

10.1063/1.4973998 ◽

2017 ◽

Vol 110 (2) ◽

pp. 022102 ◽

Cited By ~ 6

Author(s):

Sa Hoang Huynh ◽

Minh Thien Huu Ha ◽

Huy Binh Do ◽

Tuan Anh Nguyen ◽

Quang Ho Luc ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Band Offset ◽

Metalorganic Chemical

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Experimental determination of electron and hole mean drift distance: Application to chemical vapor deposition diamond

Applied Physics Letters ◽

10.1063/1.1586475 ◽

2003 ◽

Vol 82 (26) ◽

pp. 4723-4725 ◽

Cited By ~ 6

Author(s):

Marco Marinelli ◽

E. Milani ◽

G. Pucella ◽

A. Tucciarone ◽

G. Verona-Rinati ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Experimental Determination ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Diamond

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Synthesis and Structure Determination of (hfac)Ag(SEt2), Pd(hfac-C)(hfac-O,O)(SEt2), and [(hfac)Ag]4(SEt2): Ligand Exchange Reactions Relevant to Aerosol-Assisted Chemical Vapor Deposition (AACVD) of Ag1-xPdx Films

Inorganic Chemistry ◽

10.1021/ic00123a008 ◽

1995 ◽

Vol 34 (19) ◽

pp. 4767-4773 ◽

Cited By ~ 18

Author(s):

Chongying Xu ◽

Mark J. Hampden-Smith ◽

Toivo T. Kodas ◽

Eileen N. Duesler ◽

Arnold L. Rheingold ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Structure Determination ◽

Vapor Deposition ◽

Ligand Exchange ◽

Chemical Vapor ◽

Exchange Reactions

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Determination of the energy states of the donor acceptor decay emission in silicon rich oxide prepared by low-pressure chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3554735 ◽

2011 ◽

Vol 29 (2) ◽

pp. 021017 ◽

Cited By ~ 2

Author(s):

R. López-Estopier ◽

M. Aceves-Mijares ◽

Z. Yu ◽

C. Falcony

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Pressure Chemical ◽

Donor Acceptor ◽

Energy States

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