Annealing Effects on AlGaN∕GaN HEMTs Employing Excimer Laser Pulses

2005 ◽  
Vol 8 (12) ◽  
pp. G352 ◽  
Author(s):  
Min-Woo Ha ◽  
Seung-Chul Lee ◽  
Jin-Cherl Her ◽  
Kwang-Seok Seo ◽  
Min-Koo Han
Keyword(s):  
Excimer Laser ◽  
Laser Pulses ◽  
Annealing Effects ◽  
Gan Hemts

Shortening of excimer laser pulses with saturable absorbers

1984 ◽  
Vol 52 (3) ◽  
pp. 211-214 ◽  
Author(s):  
Ch.G. Christov ◽  
I.V. Tomov ◽  
I.V. Chaltakov ◽  
V.L. Lyutskanov
Keyword(s):  
Excimer Laser ◽  
Laser Pulses ◽  
Saturable Absorbers

Excimer Laser Interaction with Metals

1992 ◽  
Vol 285 ◽  
Author(s):  
W.W. Duley ◽  
G. Kinsman
Keyword(s):  
Experimental Data ◽  
Laser Radiation ◽  
Excimer Laser ◽  
Metal Surfaces ◽  
Laser Pulses ◽  
Radiative Properties ◽  
Uv Laser ◽  
Laser Interaction ◽  
Excimer Laser Radiation

ABSTRACTExcimer laser radiation may be used to process metal surfaces in a variety of novel ways. The simplest of these involves the use of UV laser pulses for ablation. Ablation occurs as the result of both vaporization and hydrodynamical effects. Experimental data related to these processes will be discussed. In addition, it will be shown how specific irradiation regimes can yield metal surfaces with unique radiative properties.

Surface hardening of SUS304 by irradiation with a KrF excimer laser in SiH4 gas ambient

1990 ◽  
Vol 5 (2) ◽  
pp. 265-270 ◽  
Author(s):  
Koji Sugioka ◽  
Hideo Tashiro ◽  
Koichi Toyoda ◽  
Eiichi Tamura ◽  
Keigo Nagasaka
Keyword(s):  
Excimer Laser ◽  
Surface Hardening ◽  
Continuous Distribution ◽  
Surface Hardness ◽  
Laser Pulses ◽  
High Concentration ◽  
Laser Fluences ◽  
High Adhesion ◽  
Krf Excimer Laser ◽  
Si Films

Surface hardening of SUS304 resulting from the process of doping and deposition of Si by irradiation of a KrF excimer laser beam in a SiH4 gas ambient is investigated, and variations of the surface hardness are examined for different numbers of laser pulses and the laser fluences. The hardening is due to Si incorporation in high concentration. The continuous distribution of Si atoms across the surface layer suggests that a very high adhesion strength of the deposited Si films can be formed. The specific process for surface modification is referred to as laser implant-deposition (LID).

Annealing effects of low pressure mercury and excimer laser light on degraded a-Si:H TFTs

1993 ◽  
Vol 164-166 ◽  
pp. 763-766 ◽  
Author(s):  
S.K. Lee ◽  
C.H. Oh ◽  
Y.S. Kim ◽  
J.S. Park ◽  
Y.I. Choi ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Light ◽  
Low Pressure ◽  
Annealing Effects

Nano-Structuring with Femtosecond Excimer Laser Pulses

2005 ◽  
pp. 279-283 ◽  
Author(s):  
J.-H. Klein-Wiele ◽  
J. Bekesi ◽  
J. Ihlemann ◽  
P. Simon
Keyword(s):  
Excimer Laser ◽  
Laser Pulses

scholarly journals Excimer Laser Induced Spatially Resolved Formation and Implantation of Plasmonic Particles in Glass

Nanomaterials ◽  
2018 ◽  
Vol 8 (12) ◽  
pp. 1035
Author(s):  
Maximilian Heinz ◽  
Jörg Meinertz ◽  
Manfred Dubiel ◽  
Jürgen Ihlemann
Keyword(s):  
Excimer Laser ◽  
Metallic Nanoparticles ◽  
Glass Matrix ◽  
Laser Pulses ◽  
Building Blocks ◽  
Phase Mask ◽  
Spatially Resolved ◽  
Stable Glass ◽  
193 Nm ◽  
Doped Glass

Metallic nanoparticles are important building blocks for plasmonic applications. The spatially defined arrangement of these nanoparticles in a stable glass matrix is obtained here by nanosecond excimer laser irradiation at 193 nm. Two approaches are addressed: (1) Laser induced formation of particles from a dopant material pre-incorporated in the glass, (2) Particle formation and implantation by irradiation of material pre-coated on top of the glass. Silver nanoparticles are formed inside Ag+ doped glass (method 1). Gold nanoparticles are implanted by irradiation of gold coated glass (method 2). In the latter case, with a few laser pulses the original gold film disintegrates into particles which are then embedded in the softened glass matrix. A micron sized spatial resolution (periodic arrangements with 2 µm period) is obtained in both cases by irradiating the samples with an interference beam pattern generated by a phase mask. The plasmonic absorption of the nanoparticles leads to a contrast of the optical density between irradiated and non-irradiated lines of up to 0.6.

Etch Performance of KRF Excimer Laser Micromachining Characterization on Silicon Material

2015 ◽  
Vol 780 ◽  
pp. 29-32 ◽  
Author(s):  
M.Z. Zainol ◽  
Yufridin Wahab ◽  
H. Fazmir ◽  
A.F.M. Anuar ◽  
S. Johari ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Etch Rate ◽  
Three Dimensional ◽  
Laser Pulses ◽  
Laser Micromachining ◽  
Rate Change ◽  
Performance Parameters ◽  
Laser Parameters ◽  
Characterization Study ◽  
Krf Excimer Laser

Excimer laser micromachining enables us to overcome the conventional lithography-based microfabrication limitations and simplify the process of creating three dimensional (3D) microstructures.The objective of this study is to investigate the relation between the number of laser pulses, number of laser passes through the channel of ablation site and their etch performance. Parameters such as frequency, fluence and velocity were retained as constants. In this paper, we present a parametric characterization study on silicon using KrF excimer laser micromachining. From the result, the etch rate change were recorded as the two major laser parameters (Number of laser pulses and number of laser passes) were varied. Both parameters were showing declination profile however from comparing both graphs, it showed that etch rate dropped more steeply when varied number of laser passes rather than number of pulses.

Efficient keV x‐ray emission from plasmas generated with 4 ps KrF excimer laser pulses

1993 ◽  
Vol 63 (22) ◽  
pp. 3046-3048 ◽  
Author(s):  
I. C. E. Turcu ◽  
I. N. Ross ◽  
G. J. Tallents
Keyword(s):  
Excimer Laser ◽  
Laser Pulses ◽  
X Ray ◽  
Krf Excimer Laser
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