High Temperature Reactive Ion Etching of Indium‐Tin Oxide with HBr and  CH 4 Mixtures

1998 ◽  
Vol 145 (12) ◽  
pp. 4313-4317 ◽  
Author(s):  
Yue Kuo ◽  
T. L. Tai
Keyword(s):  
High Temperature ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Ion Etching ◽  
Ion Etching

Characteristics of Indium-Tin Oxide Thin Film Etched by Reactive Ion Etching

1994 ◽  
Vol 33 (Part 1, No. 12B) ◽  
pp. 7057-7060 ◽  
Author(s):  
Meiso Yokoyama ◽  
Jiin Wen Li ◽  
Shui Hsiang Su ◽  
Yan Kuin Su
Keyword(s):  
Thin Film ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Ion Etching ◽  
Oxide Thin Film ◽  
Ion Etching

scholarly journals Reactive ion etching of indium-tin oxide films by CCl4-based Inductivity Coupled Plasma

2016 ◽  
Vol 741 ◽  
pp. 012105
Author(s):  
Sucheta Juneja ◽  
Sergey D Poletayev ◽  
Sergey Fomchenkov ◽  
Svetlana N Khonina ◽  
Roman V Skidanov ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Ion Etching ◽  
Oxide Films ◽  
Ion Etching ◽  
Tin Oxide Films

ChemInform Abstract: Reactive Ion Etching of Indium-Tin-Oxide Films.

ChemInform ◽  
1989 ◽  
Vol 20 (42) ◽  
Author(s):  
Z. CALAHORRA ◽  
E. MINAMI ◽  
R. M. WHITE ◽  
R. S. MULLER
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Reactive Ion Etching ◽  
Oxide Films ◽  
Ion Etching ◽  
Tin Oxide Films
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