Characterization of Crystal Quality by Crystal Originated Particle Delineation and the Impact on the Silicon Wafer Surface

1998 ◽  
Vol 145 (1) ◽  
pp. 275-284 ◽  
Author(s):  
D. Gräf ◽  
M. Suhren ◽  
U. Lambert ◽  
R. Schmolke ◽  
A. Ehlert ◽  
...  
Keyword(s):  
Silicon Wafer ◽  
Crystal Quality ◽  
Wafer Surface ◽  
Silicon Wafer Surface ◽  
The Impact

Characterization of Mass Transfer Rates and Contamination Kinetics on Silicon Wafer Surface

2013 ◽  
Vol 26 (1) ◽  
pp. 145-155 ◽  
Author(s):  
Uday B. Godse ◽  
Mikko J. V. Ponkala ◽  
John Stuber ◽  
Bassam Elkhatib ◽  
Ofodike A. Ezekoye
Keyword(s):  
Mass Transfer ◽  
Silicon Wafer ◽  
Wafer Surface ◽  
Transfer Rates ◽  
Silicon Wafer Surface

Characterization of Surface Contaminants by a Silver Film-Enhanced IR—Johnson Method

1997 ◽  
Vol 51 (10) ◽  
pp. 1460-1463 ◽  
Author(s):  
Nobuaki Marino ◽  
Kiichirou Murai ◽  
Yoshinori Kataora
Keyword(s):  
Polymer Film ◽  
Silicon Wafer ◽  
Photoelectron Spectroscopy ◽  
Present Method ◽  
Surface Characterization ◽  
Diffuse Reflectance ◽  
Silver Film ◽  
Wafer Surface ◽  
Surface Contaminants

Characterization of nanometer-order organic contaminants on polymer film and silicon wafer surface has been investigated by a modified IR–Johnson method. We have proposed a silver film-enhanced IR–Johnson method that is useful for surface contaminant analysis. In the present method, organic traces are transferred from the surface of a polymer film or silicon wafer onto the KBr particles deposited with silver film, and then the KBr particles are analyzed directly by diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS). Infrared absorption of organic traces was enhanced by the presence of silver island film. With this method, a spectrum of nanometer-order organic traces can be obtained without any interference from the polymer film substrate. The present method is as surface-sensitive as X-ray photoelectron spectroscopy (XPS) and provides a large amount of information on the chemical structure of surface contaminants. This is a promising method for the surface characterization of polymer films and silicon wafer. Index Headings: Infrared; Diffuse reflectance; Surface enhancement.

Clean Silicon Wafer Surface by a Slight Etch Method

1988 ◽  
Author(s):  
Ritsuo Takizawa ◽  
Toshiro Nakanishi ◽  
Kouichirou Honda ◽  
Akira Ohsawa
Keyword(s):  
Silicon Wafer ◽  
Wafer Surface ◽  
Silicon Wafer Surface

Analysis of the Reactant Gas Flow and Heat Transfer on the Silicon Wafer Surface Arranged in a Row in Heating Furnace

2002 ◽  
Vol 2002 (0) ◽  
pp. 275-276
Author(s):  
Naoko SAITO ◽  
Kazushige KIKUTA ◽  
Yukio HISHINUMA ◽  
Takemi CHIKAHISA ◽  
Toshimitsu MIYATA ◽  
...  
Keyword(s):  
Heat Transfer ◽  
Silicon Wafer ◽  
Gas Flow ◽  
Heating Furnace ◽  
Wafer Surface ◽  
Flow And Heat Transfer ◽  
Silicon Wafer Surface
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