Optimization of Electron Cyclotron Resonance Reactive Ion Beam Etching Reactors for Dry Etching of GaAs with Cl2

1997 ◽  
Vol 144 (9) ◽  
pp. 3191-3197 ◽  
Author(s):  
K. Nishioka ◽  
M. Sugiyama ◽  
M. Nezuka ◽  
Y Shimogaki ◽  
Y. Nakano ◽  
...  
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Ion Beam ◽  
Dry Etching ◽  
Electron Cyclotron ◽  
Ion Beam Etching ◽  
Reactive Ion Beam Etching

Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH4/H2/Ar and O2

2002 ◽  
Vol 41 (Part 1, No. 1) ◽  
pp. 15-19 ◽  
Author(s):  
Tatsuya Suzuki ◽  
Nobuo Haneji ◽  
Kunio Tada ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nakano
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Ion Beam ◽  
Electron Cyclotron ◽  
Ion Beam Etching ◽  
Cyclic Injection ◽  
Reactive Ion Beam Etching

A simple kinetic model for the optimization of electron cyclotron resonance/reactive ion beam etching performance for GaAs

1995 ◽  
Vol 67 (7) ◽  
pp. 897-899 ◽  
Author(s):  
Masakazu Sugiyama ◽  
Takayuki Yamaizumi ◽  
Masahiro Nezuka ◽  
Yukihiro Shimogaki ◽  
Yoshiaki Nanako ◽  
...  
Keyword(s):  
Kinetic Model ◽  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Ion Beam ◽  
Electron Cyclotron ◽  
Ion Beam Etching ◽  
Simple Kinetic Model ◽  
Reactive Ion Beam Etching
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