Using Interdigitated Electrodes for Measuring Photoacid Generator Kinetics in Chemically Amplified Resists

2004 ◽  
Vol 151 (2) ◽  
pp. G119 ◽  
Author(s):  
Cody M. Berger ◽  
Jeffrey D. Byers ◽  
Clifford L. Henderson
Keyword(s):  
Interdigitated Electrodes ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator

Photoacid generator–polymer interaction on the quantum yield of chemically amplified resists for extreme ultraviolet lithography

2018 ◽  
Vol 6 (27) ◽  
pp. 7267-7273 ◽  
Author(s):  
Roberto Fallica ◽  
Yasin Ekinci
Keyword(s):  
Quantum Yield ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Lithography ◽  
Polymer Backbone ◽  
Ultraviolet Lithography ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator ◽  
Polymer Interaction

The rate of photoacid generation is measured experimentally and it is demonstrated to depend on the interaction between polymer backbone and photoacid generator. The clearing volume per absorbed photon and per generated photoacid is also calculated and discussed in view of lithographic resolution and roughness.

Use of fluorescent probes to determine catalytic chain length in chemically amplified resists

2005 ◽  
Vol 83 (6-7) ◽  
pp. 869-874 ◽  
Author(s):  
Mathieu Frenette ◽  
Marius Gabriel Ivan ◽  
J C Scaiano
Keyword(s):  
Polymer Film ◽  
Chain Length ◽  
Emission Spectra ◽  
Chemically Amplified ◽  
Post Exposure Bake ◽  
Novel Method ◽  
Acid Catalyzed ◽  
Chemically Amplified Resists ◽  
Coumarin 6 ◽  
Photoacid Generator

Acid-catalyzed deprotection of tert-butoxycarbonyl (t-Boc) pendant groups present in a polymer film is one of the most common chemical reactions in photolithography. We present here a novel method to determine the catalytic chain length of this reaction under different development conditions. We demonstrate this in model PMMA thin films containing triphenylsulphonium triflate as a photoacid generator, acid sensor coumarin 6, t-Boc protected coumarin 4, and base 2-piperidin-1-yl-ethanol (2-PE). Deprotection of the t-Boc group, catalyzed by the photogenerated acid, during the post-exposure bake leads to formation of coumarin 4, a strongly fluorescent molecule whose concentration is monitored using fluorescence. We take advantage of the change in the emission spectra of coumarin 6 upon protonation to monitor acid formation. To quantify the amount of acid, an acid–base titration is done in the polymer film using 2-PE. Knowing the amount of deprotected probe and the amount of acid, we are able to calculate the number of moles of deprotected C4-t-Boc per mol of acid, which is the actual catalytic chain length.Key words: photolithography, chemical amplification, catalytic chain length, fluorescent sensors, photoacid generator.

Novel chemically amplified resists incorporating anionic photoacid generator functional groups for sub-50-nm half-pitch lithography

2009 ◽  
Vol 19 (18) ◽  
pp. 2797 ◽  
Author(s):  
Kenneth E. Gonsalves ◽  
Mingxing Wang ◽  
Cheng-Tsung Lee ◽  
Wang Yueh ◽  
Melina Tapia-Tapia ◽  
...  
Keyword(s):  
Functional Groups ◽  
Chemically Amplified ◽  
Chemically Amplified Resists ◽  
Photoacid Generator

Heating effect of the radiation chemistry of polyhydroxystyrene-type chemically amplified resists

2020 ◽  
Vol 59 (8) ◽  
pp. 086506
Author(s):  
Yuta Ikari ◽  
Kazumasa Okamoto ◽  
Akihiro Konda ◽  
Takahiro Kozawa ◽  
Takao Tamura
Keyword(s):  
Radiation Chemistry ◽  
Heating Effect ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Characterizing acid diffusion lengths in chemically amplified resists from measurements of deprotection kinetics

2014 ◽  
Vol 13 (4) ◽  
pp. 043017 ◽  
Author(s):  
Abhijit A. Patil ◽  
Yogendra Narayan Pandey ◽  
Manolis Doxastakis ◽  
Gila E. Stein
Keyword(s):  
Acid Diffusion ◽  
Chemically Amplified ◽  
Chemically Amplified Resists

Design and Lithographic Characteristics of Alicyclic Fluoropolymer for ArF Chemically Amplified Resists

2006 ◽  
Vol 45 (No. 46) ◽  
pp. L1230-L1231
Author(s):  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Masamitsu Shirai
Keyword(s):  
Chemically Amplified ◽  
Chemically Amplified Resists
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