Surface Characterization of Silicon Nitride Films Biased in Ionic Water

2000 ◽  
Vol 147 (4) ◽  
pp. 1493
Author(s):  
K. Matsuzaki ◽  
Y. Mikoshiba ◽  
H. Fujiwara
Keyword(s):  
Silicon Nitride ◽  
Surface Characterization ◽  
Silicon Nitride Films

Surface Characterization of the Milled–Silicon Nitride Nano Powders by XPS and TEM

2006 ◽  
Vol 326-328 ◽  
pp. 409-412
Author(s):  
Dae Chul Park ◽  
Toyohiko Yano ◽  
Sae Hoon Kim ◽  
Won Youl Choi ◽  
Jung Hee Cho
Keyword(s):  
Silicon Nitride ◽  
Ball Milling ◽  
Oxide Layer ◽  
Surface Characterization ◽  
Milling Time ◽  
Milling Process ◽  
Chemical State ◽  
Si3n4 Powder ◽  
Ball Milling Time

We studied the surface characterization of milled–silicon nitride nano-powders by XPS and TEM. The change of the chemical state and morphology of the oxide layer on the surface of Si3N4 nano-particles before and after a conventional wet–ball–milling process are investigated by X–ray photoelectron spectroscopy for measuring the chemical state of the oxide layer and transmission electron microscopy for observing surface morphology. The native oxide layers of as-received Si3N4 powders confirmed by HREM observation and their chemical states were different each other. As increasing ball–milling time, the chemical composition and the volume of oxide layer in Si3N4 powders were changed. The chemical state of as–received Si3N4 powder was near to SiO2 phase. After ball–milling process for long time, that of the milled Si3N4 powder shifted to Si2N2O phase. As increasing ball-milling time, the oxide layer of Si3N4 powder was also increased.

Characterization of Chemically Vapor Deposited Silicon Nitride Films from Disilane and Ammonia

1995 ◽  
Vol 34 (Part 2, No. 4A) ◽  
pp. L437-L439 ◽  
Author(s):  
Redhouane Henda ◽  
Larbi Laanab ◽  
EmmanuelScheid ◽  
Robert Fourmeaux
Keyword(s):  
Silicon Nitride ◽  
Silicon Nitride Films ◽  
Chemically Vapor Deposited

Characterization of silicon nitride films formed in an RF glow discharge

1988 ◽  
Vol 33-34 ◽  
pp. 742-749 ◽  
Author(s):  
Kenji Murakami ◽  
Takayuki Takeuchi ◽  
Kenji Ishikawa ◽  
Tatsuo Yamamoto
Keyword(s):  
Silicon Nitride ◽  
Glow Discharge ◽  
Silicon Nitride Films ◽  
Rf Glow Discharge
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