Methylsiloxane Spin-on-Glass Films for Low Dielectric Constant Interlayer Dielectrics

2000 ◽  
Vol 147 (4) ◽  
pp. 1477 ◽  
Author(s):  
Noriko Yamada ◽  
Toru Takahashi
Keyword(s):  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Interlayer Dielectrics ◽  
Low Dielectric ◽  
Glass Films

Deposition and Characterization of Low-Dielectric-Constant SiOC(-H) Thin Films for Interlayer Dielectrics in Multilevel Interconnections

2007 ◽  
Vol 50 (6) ◽  
pp. 1803 ◽  
Author(s):  
Rangaswamy Navamathavan ◽  
An Soo Jung ◽  
Hyun Seung Kim ◽  
Young Jun Jang ◽  
Chi Kyu Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Interlayer Dielectrics ◽  
Low Dielectric

Dehydration after Plasma Oxidation of Porous Low-Dielectric-Constant Spin-on-Glass Films

2000 ◽  
Vol 39 (Part 1, No. 7A) ◽  
pp. 3919-3923 ◽  
Author(s):  
Eiichi Kondoh ◽  
Tanemasa Asano ◽  
Hiroki Arao ◽  
Akira Nakashima ◽  
Michio Komatsu
Keyword(s):  
Dielectric Constant ◽  
Low Dielectric Constant ◽  
Plasma Oxidation ◽  
Low Dielectric ◽  
Glass Films

Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

1998 ◽  
Vol 37 (Part 1, No. 4A) ◽  
pp. 1809-1814 ◽  
Author(s):  
Kazuhiko Endo ◽  
Toru Tatsumi ◽  
Yoshihisa Matsubara ◽  
Tadahiko Horiuchi
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Amorphous Carbon ◽  
Low Dielectric Constant ◽  
Interlayer Dielectrics ◽  
Low Dielectric ◽  
Carbon Thin Films

Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-on-Glass Films Using Different Methods of Nondestructive Instrumentation

2001 ◽  
Vol 40 (Part 2, No. 4A) ◽  
pp. L323-L326 ◽  
Author(s):  
Eiichi Kondoh ◽  
Mikhail R. Baklanov ◽  
Eric Lin ◽  
David Gidley ◽  
Akira Nakashima
Keyword(s):  
Dielectric Constant ◽  
Comparative Study ◽  
Pore Size ◽  
Low Dielectric Constant ◽  
Low Dielectric ◽  
Glass Films
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