Facet‐Free Selective Silicon Epitaxy by Reduced‐Pressure Chemical Vapor Deposition Process Evaluation and Impact on Shallow Trench Isolation

1999 ◽  
Vol 146 (5) ◽  
pp. 1895-1902 ◽  
Author(s):  
Katherine E. Violette ◽  
Chih‐Ping Chao ◽  
Rick Wise ◽  
Sreenath Unnikrishnan
Keyword(s):  
Chemical Vapor Deposition ◽  
Process Evaluation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Reduced Pressure ◽  
Shallow Trench Isolation ◽  
Silicon Epitaxy ◽  
Trench Isolation ◽  
Pressure Chemical

scholarly journals Ge / SiGe Multi Quantum Well Fabrication by Using Reduced Pressure Chemical Vapor Deposition

2019 ◽  
Author(s):  
Y. Yamamoto ◽  
O. Skibitzki ◽  
M.A. Schubert ◽  
M. Scuderi ◽  
F. Reichmann ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Quantum Well ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Reduced Pressure ◽  
Pressure Chemical ◽  
Multi Quantum Well

Ge/SiGe multiple quantum well fabrication by reduced-pressure chemical vapor deposition

2020 ◽  
Vol 59 (SG) ◽  
pp. SGGK10
Author(s):  
Yuji Yamamoto ◽  
Oliver Skibitzki ◽  
Markus Andreas Schubert ◽  
Mario Scuderi ◽  
Felix Reichmann ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Quantum Well ◽  
Vapor Deposition ◽  
Multiple Quantum Well ◽  
Chemical Vapor ◽  
Multiple Quantum ◽  
Reduced Pressure ◽  
Pressure Chemical
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