Electrodes of Nitrogen-Incorporated Tetrahedral Amorphous Carbon A Novel Thin-Film Electrocatalytic Material with Diamond-like Stability

1999 ◽  
Vol 2 (5) ◽  
pp. 233 ◽  
Author(s):  
Kwangsun Yoo
1996 ◽  
Vol 423 ◽  
Author(s):  
F. J. Clough ◽  
B. Kleinsorge ◽  
W. I. Milne ◽  
J. Robertson

AbstractThis paper describes the design and fabrication of a carbon based thin film transistor (TFT). The active layer is formed from a novel form of amorphous carbon (a-C) known as tetrahedrally bonded amorphous carbon (ta-C) which can be deposited at room temperature using a filtered cathodic vacuum arc (FCVA) technique. In its ‘as grown’ condition, ta-C is p-type and the devices described here, produced using undoped material, exhibit p-channel operation.


2015 ◽  
Vol 7 (11) ◽  
pp. 4481-4485 ◽  
Author(s):  
D'Nisha Hamblin ◽  
Joy Qiu ◽  
Lars Haubold ◽  
Greg M. Swain

The performance of a nitrogen-incorporated tetrahedral amorphous (ta-C:N) carbon thin-film electrode was evaluated using flow injection analysis with amperometric detection.


2015 ◽  
Vol 59 ◽  
pp. 30-39 ◽  
Author(s):  
Tommi Palomäki ◽  
Sara Chumillas ◽  
Sami Sainio ◽  
Vera Protopopova ◽  
Minna Kauppila ◽  
...  

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