(Invited) Surface Passivation of High-k Dielectric Materials on Diamond Thin Films

K. K. Kovi; S. Majdi; M. Gabrysch; N. Suntornwipat; J. Isberg

doi:10.1149/06905.0061ecst

(Invited) Surface Passivation of High-k Dielectric Materials on Diamond Thin Films

ECS Transactions ◽

10.1149/06905.0061ecst ◽

2015 ◽

Vol 69 (5) ◽

pp. 61-65 ◽

Cited By ~ 1

Author(s):

K. K. Kovi ◽

S. Majdi ◽

M. Gabrysch ◽

N. Suntornwipat ◽

J. Isberg

Keyword(s):

Thin Films ◽

Surface Passivation ◽

Dielectric Materials ◽

High K ◽

Diamond Thin Films ◽

High K Dielectric

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(Invited) Surface Passivation of High-k Dielectric Materials on Diamond Thin Films

ECS Meeting Abstracts ◽

10.1149/ma2015-02/18/818 ◽

2015 ◽

Keyword(s):

Thin Films ◽

Surface Passivation ◽

Dielectric Materials ◽

High K ◽

Diamond Thin Films ◽

High K Dielectric

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Redefining High-k Dielectric Materials Vision at Nanoscale for Energy Storage: A New Electrochemically Active Protection Barrier

Electrochimica Acta ◽

10.1016/j.electacta.2021.138727 ◽

2021 ◽

pp. 138727

Author(s):

Anthony Valero ◽

Adrien Mery ◽

Dorian Gaboriau ◽

Marc Dietrich ◽

Maggie Fox ◽

...

Keyword(s):

Energy Storage ◽

Dielectric Materials ◽

High K ◽

Electrochemically Active ◽

Active Protection ◽

High K Dielectric

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A Comparative Study of various High-K Dielectric Materials as Gate Oxide Layer on TG FinFET

10.1109/gcat52182.2021.9587772 ◽

2021 ◽

Author(s):

Arunita Mukherjee ◽

Rajendra Kumar Nagaria

Keyword(s):

Comparative Study ◽

Oxide Layer ◽

Gate Oxide ◽

Dielectric Materials ◽

High K ◽

High K Dielectric

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Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications

Journal of Materials Research ◽

10.1557/jmr.2019.335 ◽

2019 ◽

Vol 35 (7) ◽

pp. 775-794 ◽

Cited By ~ 6

Author(s):

Woojin Jeon

Keyword(s):

Atomic Layer Deposition ◽

Random Access ◽

Random Access Memory ◽

Atomic Layer ◽

Dielectric Materials ◽

Access Memory ◽

Layer Deposition ◽

High K ◽

High K Dielectric ◽

Image Position

Abstract

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Surface Smoothing And Roughening Effects of High-k Dielectric Materials Deposited by Atomic Layer Deposition and Their Significance for MIM Capacitors Used in DRAM Technology

2019 China Semiconductor Technology International Conference (CSTIC) ◽

10.1109/cstic.2019.8755629 ◽

2019 ◽

Cited By ~ 2

Author(s):

W.S. Lau

Keyword(s):

Atomic Layer Deposition ◽

Atomic Layer ◽

Dielectric Materials ◽

Surface Smoothing ◽

Layer Deposition ◽

High K ◽

High K Dielectric ◽

Mim Capacitors

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Physical Mechanisms regarding Why It Is Difficult to Correlate the Leakage Current of Capacitor Structures Involving High-K Dielectric Materials and Defect States Detected Spectroscopically by the Thermally Stimulated Current Technique

ECS Meeting Abstracts ◽

10.1149/ma2011-01/22/1375 ◽

2011 ◽

Keyword(s):

Leakage Current ◽

Dielectric Materials ◽

Defect States ◽

Thermally Stimulated Current ◽

Physical Mechanisms ◽

Current Technique ◽

High K ◽

High K Dielectric

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Comparative performance of the ultra-short channel technology for the DG-FinFET characteristics using different high-k dielectric materials

Indian Journal of Physics ◽

10.1007/s12648-020-01846-9 ◽

2020 ◽

Author(s):

Nassima Bourahla ◽

Ahmed Bourahla ◽

Baghdad Hadri

Keyword(s):

Dielectric Materials ◽

Short Channel ◽

Comparative Performance ◽

High K ◽

High K Dielectric

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A- and B-Site Modified Perovskite Nanosheets and Their Integrations into High-k Dielectric Thin Films

International Journal of Applied Ceramic Technology ◽

10.1111/j.1744-7402.2011.00713.x ◽

2011 ◽

Vol 9 (1) ◽

pp. 29-36 ◽

Cited By ~ 23

Author(s):

Minoru Osada ◽

Takayoshi Sasaki

Keyword(s):

Thin Films ◽

Dielectric Thin Films ◽

High K ◽

High K Dielectric

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High K Dielectric Thin Films For Affordable Wireless Mobile Communications Systems

ECS Meeting Abstracts ◽

10.1149/ma2005-02/11/426 ◽

2005 ◽

Keyword(s):

Thin Films ◽

Mobile Communications ◽

Dielectric Thin Films ◽

Wireless Mobile Communications ◽

Communications Systems ◽

High K ◽

Mobile Communications Systems ◽

High K Dielectric ◽

Wireless Mobile

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Multilevel Resistive Memory Switching in Amorphous Ternary High K-Dielectric Oxide LaGdO3 Thin Films Grown By Pulsed Laser Deposition

ECS Meeting Abstracts ◽

10.1149/ma2014-01/39/1466 ◽

2014 ◽

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Resistive Memory ◽

Memory Switching ◽

High K ◽

High K Dielectric

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