(Invited) Atomic Layer Deposition of Multicomponent Metal Sulfides Applied to Thin Film Photovoltaics

2013 ◽  
Vol 58 (10) ◽  
pp. 95-104 ◽  
Author(s):  
E. Thimsen
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Sulfides ◽  
Layer Deposition ◽  
Thin Film Photovoltaics

scholarly journals Low-Temperature Atomic Layer Deposition of CuSbS2 for Thin-Film Photovoltaics

2017 ◽  
Vol 9 (5) ◽  
pp. 4667-4673 ◽  
Author(s):  
Shannon C. Riha ◽  
Alexandra A. Koegel ◽  
Jonathan D. Emery ◽  
Michael J. Pellin ◽  
Alex B. F. Martinson
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Thin Film Photovoltaics

Reaction Mechanism of Atomic Layer Deposition of Aluminum Sulfide using Trimethylaluminum and Hydrogen Sulfide

2021 ◽  
Author(s):  
Yanghong Yu ◽  
Zhongchao Zhou ◽  
Lina Xu ◽  
Yihong Ding ◽  
Guoyong Fang
Keyword(s):  
Hydrogen Sulfide ◽  
Reaction Mechanism ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Sulfides ◽  
Layer Deposition

Atomic layer deposition (ALD) is a nanopreparation technique for materials and is widely used in the fields of microelectronics, energy and catalysis. ALD methods for metal sulfides, such as Al2S3...

Atomic Layer Deposition of Chalcogenides for Next-Generation Phase Change Memory

2021 ◽  
Author(s):  
Yoon Kyeung Lee ◽  
Chanyoung Yoo ◽  
Woohyun Kim ◽  
Jeongwoo Jeon ◽  
Cheol Seong Hwang
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Film Growth ◽  
Phase Change Memory ◽  
Film Surface ◽  
Atomic Layer ◽  
Thin Film Growth ◽  
Growth Technique ◽  
Layer Deposition ◽  
Change Memory

Atomic layer deposition (ALD) is a thin film growth technique that uses self-limiting, sequential reactions localized at the growing film surface. It guarantees exceptional conformality on high-aspect-ratio structures and controllability...

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

2013 ◽  
Vol 542 ◽  
pp. 219-224 ◽  
Author(s):  
Väino Sammelselg ◽  
Ivan Netšipailo ◽  
Aleks Aidla ◽  
Aivar Tarre ◽  
Lauri Aarik ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Metal Oxides ◽  
Chemical Resistance ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals High power nano-structured V2O5 thin film cathodes by atomic layer deposition

2014 ◽  
Vol 2 (36) ◽  
pp. 15044-15051 ◽  
Author(s):  
Erik Østreng ◽  
Knut Bjarne Gandrud ◽  
Yang Hu ◽  
Ola Nilsen ◽  
Helmer Fjellvåg
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
High Power ◽  
Atomic Layer ◽  
Li Ion Batteries ◽  
Layer Deposition ◽  
Li Ion

Atomic layer deposition (ALD) has been used to prepare nano-structured cathode films for Li-ion batteries of V2O5 from VO(thd)2 and ozone at 215 °C.

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