Surface Layers in Alkaline Media: Nickel Hydrides on Metallic Nickel Electrodes

2013 ◽  
Vol 50 (31) ◽  
pp. 165-179 ◽  
Author(s):  
D. S. Hall ◽  
C. Bock ◽  
B. R. MacDougall
2014 ◽  
Vol 20 (6) ◽  
pp. 405-412
Author(s):  
U. Antons ◽  
M. Raupach ◽  
O. Weichold

Abstract The paper focuses on how alkaline media, UV radiation, and carbonation as well as on-going cement hydration affects hydrophobic treatments of concrete and influences the properties of these water-repellent layers. Single-sided nuclear magnetic resonance measurements show that layers formed by impregnating samples with alkyl trialkoxysilanes are stable even under long-term exposure to alkaline solution and UV radiation, with the damage of the latter being limited to the topmost surface layers. Microstructural changes during accelerated carbonation of blast furnace slag cement based concrete have a major impact on the hydrophobic layer properties, while the carbonation of Portland cement concrete has no influence. On-going hydration additionally influences the hydrophobic layer properties.


1991 ◽  
Vol 138 (5) ◽  
pp. 1353-1358 ◽  
Author(s):  
S. D. Bhakta ◽  
D. D. Macdonald ◽  
B. G. Pound ◽  
M. Urquidi‐Macdonald

1998 ◽  
Vol 442 (1-2) ◽  
pp. 125-135 ◽  
Author(s):  
M Bernardini ◽  
N Comisso ◽  
G Davolio ◽  
G Mengoli

1998 ◽  
Vol 457 (1-2) ◽  
pp. 205-219 ◽  
Author(s):  
Michele Bernardini ◽  
Nicola Comisso ◽  
Giuliano Mengoli ◽  
Livio Sinico

2003 ◽  
Vol 88 (3) ◽  
pp. 320-328 ◽  
Author(s):  
Debora Giovanelli ◽  
Nathan S. Lawrence ◽  
Li Jiang ◽  
Timothy G.J. Jones ◽  
Richard G. Compton

2006 ◽  
Vol 74 (5) ◽  
Author(s):  
Xiaojiao San ◽  
Yanming Ma ◽  
Tian Cui ◽  
Wenjiong He ◽  
Bai Han ◽  
...  

1984 ◽  
Vol 75 ◽  
pp. 407-422
Author(s):  
William K. Hartmann

ABSTRACTThe nature of collisions within ring systems is reviewed with emphasis on Saturn's rings. The particles may have coherent icy cores and less coherent granular or frosty surface layers, consistent with thermal eclipse observations. Present-day collisions of such ring particles do not cause catastrophic fragmentation of the particles, although some minor surface erosion and reaccretion is possible. Evolution by collisional fragmentation is thus not as important as in the asteroid belt.


Author(s):  
William J. Baxter

In this form of electron microscopy, photoelectrons emitted from a metal by ultraviolet radiation are accelerated and imaged onto a fluorescent screen by conventional electron optics. image contrast is determined by spatial variations in the intensity of the photoemission. The dominant source of contrast is due to changes in the photoelectric work function, between surfaces of different crystalline orientation, or different chemical composition. Topographical variations produce a relatively weak contrast due to shadowing and edge effects.Since the photoelectrons originate from the surface layers (e.g. ∼5-10 nm for metals), photoelectron microscopy is surface sensitive. Thus to see the microstructure of a metal the thin layer (∼3 nm) of surface oxide must be removed, either by ion bombardment or by thermal decomposition in the vacuum of the microscope.


Author(s):  
Virgil Peck ◽  
W. L. Carter

Any electron microscopical study of the morphology of bulk polymers has throughout the years been hampered by the lack of any real ability to produce meaningful surface variations for replication. True etching of polymers should show crystalline and amorphous regions in some form of relief. The use of solvents, acids, organic vapors, and inert ion bombardment to etch samples has proved to be useful only in limited applications. Certainly many interpretations of these results are subject to question.The recent use of a radiofrequency (R. F.) plasma of oxygen to degrade and remove organic material with only minor heating has opened a new possibility for etching polymers. However, rigid control of oxygen flow, time, current, and sample position are necessary in order to obtain reproducible results. The action is confined to surface layers; the molecular weight of the polymer residue after heavy etching is the same as the molecular weight of the polymer before attack, within the accuracy of measurement.


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