Electrical Characterization of Ti–Silicate Films Grown by Atomic Layer Chemical Vapor Deposition

Seungjae Lee; Kijung Yong

doi:10.1143/jjap.46.5259

Electrical Characterization of Ti–Silicate Films Grown by Atomic Layer Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.46.5259 ◽

2007 ◽

Vol 46 (8A) ◽

pp. 5259-5263 ◽

Cited By ~ 4

Author(s):

Seungjae Lee ◽

Kijung Yong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Atomic Layer

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Preparation and Electrical Characterization of CeO$_{2}$ Films for Gate Dielectrics Application: Comparative Study of Chemical Vapor Deposition and Atomic Layer Deposition Processes

Japanese Journal of Applied Physics ◽

10.1143/jjap.50.10pa06 ◽

2011 ◽

Vol 50 (10) ◽

pp. 10PA06 ◽

Cited By ~ 4

Author(s):

Miyuki Kouda ◽

Kenji Ozawa ◽

Kuniyuki Kakushima ◽

Parhat Ahmet ◽

Hiroshi Iwai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Gate Dielectrics ◽

Electrical Characterization ◽

Chemical Vapor ◽

Atomic Layer ◽

Layer Deposition ◽

Deposition Processes

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Atomic Layer Chemical Vapor Deposition and Electrical Characterization of Hafnium Silicate Films

Journal of The Electrochemical Society ◽

10.1149/1.1869977 ◽

2005 ◽

Vol 152 (4) ◽

pp. F45 ◽

Cited By ~ 14

Author(s):

Jaehyun Kim ◽

Kijung Yong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Atomic Layer ◽

Hafnium Silicate

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Preparation and Electrical Characterization of CeO2Films for Gate Dielectrics Application: Comparative Study of Chemical Vapor Deposition and Atomic Layer Deposition Processes

Japanese Journal of Applied Physics ◽

10.7567/jjap.50.10pa06 ◽

2011 ◽

Vol 50 (10S) ◽

pp. 10PA06 ◽

Cited By ~ 2

Author(s):

Miyuki Kouda ◽

Kenji Ozawa ◽

Kuniyuki Kakushima ◽

Parhat Ahmet ◽

Hiroshi Iwai ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Comparative Study ◽

Vapor Deposition ◽

Gate Dielectrics ◽

Electrical Characterization ◽

Chemical Vapor ◽

Atomic Layer ◽

Layer Deposition ◽

Deposition Processes

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Electrical characterization of Si-doped conductive AlInN films grown nearly lattice-matched to c-plane GaN on sapphire by metalorganic chemical vapor deposition

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/6.0000284 ◽

2020 ◽

Vol 38 (5) ◽

pp. 052205

Author(s):

Makoto Miyoshi ◽

Taiki Nakabayashi ◽

Mizuki Yamanaka ◽

Takashi Egawa ◽

Tetsuya Takeuchi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Si Doped ◽

Lattice Matched ◽

Metalorganic Chemical

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Electrical Characterization of Aluminum-Oxynitride Stacked Gate Dielectrics Prepared by a Layer-by-Layer Process of Chemical Vapor Deposition and Rapid Thermal Nitridation

IEICE Transactions on Electronics ◽

10.1093/ietele/e88-c.4.640 ◽

2005 ◽

Vol E88-C (4) ◽

pp. 640-645 ◽

Cited By ~ 4

Author(s):

H. MURAKAMI

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gate Dielectrics ◽

Electrical Characterization ◽

Chemical Vapor ◽

Layer By Layer ◽

Aluminum Oxynitride ◽

Thermal Nitridation

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Current induced annealing and electrical characterization of single layer graphene grown by chemical vapor deposition for future interconnects in VLSI circuits

Applied Physics Letters ◽

10.1063/1.4895802 ◽

2014 ◽

Vol 105 (11) ◽

pp. 113513 ◽

Cited By ~ 6

Author(s):

Neetu Prasad ◽

Anita Kumari ◽

P. K. Bhatnagar ◽

P. C. Mathur ◽

C. S. Bhatia

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrical Characterization ◽

Single Layer ◽

Chemical Vapor ◽

Vlsi Circuits ◽

Single Layer Graphene ◽

Layer Graphene

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Electrical characterization of Si-donor-related shallow and deep states in InGaAlP alloys grown by metalorganic chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/0022-0248(91)90793-5 ◽

1991 ◽

Vol 115 (1-4) ◽

pp. 498-503 ◽

Cited By ~ 17

Author(s):

Mariko Suzuki ◽

Masayuki Ishikawa ◽

Kazuhiko Itaya ◽

Yukie Nishikawa ◽

Gen-ichi Hatakoshi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Metalorganic Chemical

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Strain and Electrical Characterization of Boron-Doped SiGeC Layers Grown by Chemical Vapor Deposition

Physica Scripta ◽

10.1088/0031-8949/2004/t114/006 ◽

2004 ◽

Vol T114 ◽

pp. 31-33

Author(s):

J Hållstedt ◽

A Parent ◽

S-L Zhang ◽

M Östling ◽

H H Radamson

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Boron Doped

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Electrical Characterization of Silicon Dioxide Thin Film Prepared by ArF Excimer Laser Chemical Vapor Deposition from Silicon Tetraacetate

Japanese Journal of Applied Physics ◽

10.1143/jjap.36.l150 ◽

1997 ◽

Vol 36 (Part 2, No. 2A) ◽

pp. L150-L153 ◽

Cited By ~ 2

Author(s):

Atsushi Maruyama ◽

Kazuhiro Nakata ◽

Ken Yukimura ◽

Toshiro Maruyama

Keyword(s):

Thin Film ◽

Chemical Vapor Deposition ◽

Silicon Dioxide ◽

Excimer Laser ◽

Vapor Deposition ◽

Electrical Characterization ◽

Chemical Vapor ◽

Laser Chemical Vapor Deposition ◽

Arf Excimer Laser

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Optical and electrical characterization of SiO2 films obtained by atmospheric pressure chemical vapor deposition

physica status solidi (c) ◽

10.1002/pssc.200674157 ◽

2007 ◽

Vol 4 (4) ◽

pp. 1481-1484 ◽

Cited By ~ 6

Author(s):

H. Juárez ◽

T. Díaz ◽

M. Pacio ◽

G. García S. ◽

E. Rosendo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Atmospheric Pressure ◽

Electrical Characterization ◽

Chemical Vapor ◽

Sio2 Films ◽

Pressure Chemical

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