Methyl "radicals" on doped silica gel surfaces
Keyword(s):
Methyl radicals adsorbed on silica gels containing dopings of the semiconductor ZnO were investigated by electron spin resonance at 77 °K. In addition to the normal 4-line "a"-spectrum, with hyperfine splitting of 23.3 ± 0.2 G, a second broader 4-line spectrum "b" with splitting 18.8 ± 0.6 G appears. Variations in line intensity with extent of doping were measured. Disappearance of the b-spectrum when the doped gels were dried under hot oxygen was observed. Partial delocalization of the radical's free electron and mixing into the doped surface were clearly indicated.Satellites ("c") to the a-spectrum were observed and are discussed.
1972 ◽
Vol 50
(12)
◽
pp. 1825-1830
◽
Keyword(s):
1974 ◽
Vol 39
(25)
◽
pp. 3800-3802
◽
Keyword(s):
1970 ◽
Vol 24
◽
pp. 3265-3275
◽
Keyword(s):
Keyword(s):
1984 ◽
Vol 88
(18)
◽
pp. 3990-3993
◽
1990 ◽
Vol 63
(4)
◽
pp. 1154-1159
◽
1968 ◽
Vol 49
(12)
◽
pp. 5558-5558
◽