Modelling of bonding pads and their effect on the high-frequency-noise figure of polysilicon emitter bipolar junction transistors

1996 ◽  
Vol 74 (S1) ◽  
pp. 200-204 ◽  
Author(s):  
M. J. Deen ◽  
J. Ilowski

This paper presents detailed experimental results on the input impedance of bonding pads, and a simple electrical model that accurately describes the impedances of these pads as a function of frequency for five different types of pad structures. It also describes the effects of the bonding pads on the minimum high-frequency-noise figure (NFMIN) of polysilicon emitter npn bipolar junction transistors as functions of collector current density and emitter areas. It was found that for devices with larger emitter areas (AE > 48 μm2) and relatively low base resistance (RB < 30 Ω), the effects of the same bonding pads on the noise figure was not as pronounced as for the smaller area devices with larger base resistances. For a device with AE = 3.2 μm2 operating at 1 GHz, biased with a collector density of 0.15 mA μm−2, neglect of the effects of the bonding pads results in too low NFMIN (by 1–2 dB) when calculated values were compared to measurements. Finally, for devices with the same emitter areas, bonding pads with smaller impedance results in a larger NFMIN compared to measurements on similar transistors with pads of larger impedances.

1996 ◽  
Vol 74 (S1) ◽  
pp. 195-199 ◽  
Author(s):  
M. Jamal Deen

This paper presents detailed results from modelling the four noise parameters: minimum noise figure (NFMIN), noise resistance (RN), optimal source resistance (RS,OPT), and reactance (XS,OPT) as functions of frequency and collector-biasing current. Compared to previous BJT (bipolar junction transistor) high-frequency noise models, we include the emitter resistance, which results in an increased input device impedance, and a degeneration of the device transconductance. We also give an explicit formula for the noise resistance. We present noise results for polysilicon emitter bipolar transistors as a function of emitter areas to demonstrate how the noise parameters scale with emitter areas over a range of frequencies. However, these results are given only for devices in which the pad impedances are much larger than the device input impedance, so that very little input signal is lost through the pads to ground.


Micromachines ◽  
2020 ◽  
Vol 12 (1) ◽  
pp. 7
Author(s):  
Yu-Shyan Lin ◽  
Shin-Fu Lin

This study proposes AlGaN/GaN/silicon high-electron mobility transistors (HEMTs) grown by a metallorganic chemical vapor deposition (MOCVD) system. The large-signal linearity and high-frequency noise of HEMTs without and with different passivation layers are compared. The experimental data show that the addition of a TiO2 passivation layer to undoped AlGaN/GaN HEMT’s increases the value of the third-order intercept point (OIP3) by up to 70% at 2.4 GHz. Furthermore, the minimum noise figure (NFmin) of the HEMT with TiO2 passivation is significantly reduced.


2010 ◽  
Vol E93-C (5) ◽  
pp. 678-684 ◽  
Author(s):  
Hiroshi SHIMOMURA ◽  
Kuniyuki KAKUSHIMA ◽  
Hiroshi IWAI

2019 ◽  
Vol 67 (4) ◽  
pp. 315-329
Author(s):  
Rongjiang Tang ◽  
Zhe Tong ◽  
Weiguang Zheng ◽  
Shenfang Li ◽  
Li Huang

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