Minority carrier diffusion length determination from capacitance measurements in Se–CdO photovoltaic cells

1991 ◽  
Vol 69 (3-4) ◽  
pp. 538-542 ◽  
Author(s):  
C. H. Champness ◽  
Z. A. Shukri ◽  
C. H. Chan

In Se–CdO photovoltaic cells, the electron diffusion length Ln in the selenium absorber layer has been determined from measurements of capacitance C and photocurrent under monochromatic illumination by variation of applied reverse bias. If penetrating incident light of band-gap wavelength is used, a plot against 1/C of the illuminated-to-dark current change ΔI yields a straight line over a certain range of bias values. Extrapolation of this line to the 1/C axis yields Ln. It was found in the fabrication of the Se–CdO cells that increasing the substrate temperature from 100 to 140 °C during the selenium deposition resulted in an increase in the cell photovoltaic output. Capacitance and ΔI measurements on these cells showed an increase in diffusion length with substrate temperature, indicating that the increased cell performance was due to improved electron collection in the selenium layer.

Author(s):  
D.P. Malta ◽  
M.L. Timmons

Measurement of the minority carrier diffusion length (L) can be performed by measurement of the rate of decay of excess minority carriers with the distance (x) of an electron beam excitation source from a p-n junction or Schottky barrier junction perpendicular to the surface in an SEM. In an ideal case, the decay is exponential according to the equation, I = Ioexp(−x/L), where I is the current measured at x and Io is the maximum current measured at x=0. L can be obtained from the slope of the straight line when plotted on a semi-logarithmic scale. In reality, carriers recombine not only in the bulk but at the surface as well. The result is a non-exponential decay or a sublinear semi-logarithmic plot. The effective diffusion length (Leff) measured is shorter than the actual value. Some improvement in accuracy can be obtained by increasing the beam-energy, thereby increasing the penetration depth and reducing the percentage of carriers reaching the surface. For materials known to have a high surface recombination velocity s (cm/sec) such as GaAs and its alloys, increasing the beam energy is insufficient. Furthermore, one may find an upper limit on beam energy as the diameter of the signal generation volume approaches the device dimensions.


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