Raman and X-ray diffraction study of relaxation in Si–Si1–xGex strained-layer superlattices
We report a study of the relaxation of Si–Si1–xGex strained single layers and superlattices by Raman scattering spectroscopy, double crystal X-ray diffraction, and transmission and scanning electron microscopy. Samples of various dimensions and compositions were produced by molecular beam epitaxy at a growth temperature of 500 ± 30 °C. The thermal stability of the various specimens was investigated by annealing experiments at temperatures between 600 and 900 °C. Considerable deterioration of the crystal quality and progressive relaxation were observed in some of the samples. Relaxation occurred through formation of misfit dislocations at the first Si–Si1–xGex interface and these caused threading dislocations to form within the epilayer. The degradation of the superlattice interfaces on annealing is correlated with a sharp decrease in the acoustic mode Raman intensities. Strain values perpendicular to the growth direction as a function of annealing temperature are obtained from a kinematical simulation of the X-ray rocking curves. These results are compared with the frequency shifts of the longitudinal optical phonons in the Raman spectra. The results obtained for the critical layer thicknesses versus x are consistent with the excess stress model of Tsao and co-workers.