Continuous-wave laser-induced diffusion in silicon
A novel processing technique to form shallow p-n junctions using a continuous-wave (cw) laser beam scanned over a large area is described. The results of computer simulation of the heat-flow problem were used to find the optimum condition for cw laser-induced liquid-phase diffusion. High-speed scanning of the laser beam and the application of phosphosilica glass as a diffusion source, which also acts as an antireflective coat, are essential parts of the process. The optimum incident laser power was around 7.5 W with a scanning speed of 100 cm/s. This process produced junction depths of around 0.2–0.4 μm. Reliable contacts to the shallow diffusions were made using tungsten silicide formed prior to the aluminum deposition. The p-n junctions formed by this technique showed good diode characteristics with breakdown voltages over 35 V and leakage current around 10−5 A/cm2.