4,6-Dicarba-8-thia-arachno-nonaborane(10) Revisited. Theoretical Refinement of Its Structure

1999 ◽  
Vol 64 (6) ◽  
pp. 993-1000 ◽  
Author(s):  
Drahomír Hnyk ◽  
Matthias Hofmann ◽  
Paul von Ragué Schleyer

The structure of the nine-vertex arachno-thiadicarbaborane C2SB6H10 has been established employing the ab initio/IGLO/NMR method. Theoretical IGLO 11B chemical shifts support C and S atom placements at the 4, 6 and 8 positions, respectively, and unambiguously rule out the 4,6,5-C2SB6H10 structural alternative, suggested earlier on the basis of IR and Raman spectroscopy. Important structural features of the 4,6,8-C2SB6H10 geometry include a small B(7)-S(8)-B(9) angle (MP2(fc)/6-31G*: 97.9°) and long S-B bonds (MP2(fc)/6-31G*: 1.905 and 1.924 Å) compared to B-B bonds spanning the 1.71-1.85 Å range.

2005 ◽  
Vol 39 (2) ◽  
pp. 249-256 ◽  
Author(s):  
Hartwig Schulz ◽  
Gülcan Özkan ◽  
Malgorzata Baranska ◽  
Hans Krüger ◽  
Musa Özcan

2000 ◽  
Vol 65 (5-6) ◽  
pp. 399-406 ◽  
Author(s):  
Ubavka Mioc ◽  
Marija Todorovic ◽  
Snezana Uskokovic-Markovic ◽  
Zoran Nedic ◽  
Nada Bosnjakovic

In this paper the latest results of our continuing investigation of heteropoly acids and their salts are reported. Specially attention was paid to the influence of cations on the dynamic equilibrium of protonic species, as well as on the structure of the host lattice itself, i.e., the Keggin anions. The investigations were done by IR and Raman spectroscopy within the range of 1200.40 cm-1.


Author(s):  
K. Antonova ◽  
P. Byshewski ◽  
G. Zhizhin ◽  
J. Piechota ◽  
M. Marhevka

Author(s):  
D. Jay Anderson ◽  
Mustafa Kansiz ◽  
Michael Lo ◽  
Eoghan Dillon ◽  
Curtis Marcott

Abstract Rapid identification of organic contamination in the semi and semi related industry is a major concern for research and manufacturing. Organic contamination can affect a system or subsystem’s performance and cause premature failure of the product. As an example, in February 2019 the Taiwan Semiconductor Manufacturing Company (TMSC), a major semiconductor manufacturer, reported that a photoresist it used included a specific element which was abnormally treated, creating a foreign polymer in the photoresist resulting in an estimated loss of $550M [1].


2001 ◽  
Vol 596 (1-3) ◽  
pp. 151-156 ◽  
Author(s):  
P. Pasierb ◽  
S. Komornicki ◽  
M. Rokita ◽  
M. Rȩkas

Sign in / Sign up

Export Citation Format

Share Document