Fabrication of semiconductor-and polymer-based photonic crystals using nanoimprint lithography

2005 ◽  
Vol 50 (8) ◽  
pp. 1043-1047 ◽  
Author(s):  
E. M. Arakcheeva ◽  
E. M. Tanklevskaya ◽  
S. I. Nesterov ◽  
M. V. Maksimov ◽  
S. A. Gurevich ◽  
...  
2007 ◽  
Vol 90 (11) ◽  
pp. 111114 ◽  
Author(s):  
Kuniaki Ishihara ◽  
Masayuki Fujita ◽  
Ippei Matsubara ◽  
Takashi Asano ◽  
Susumu Noda ◽  
...  

Author(s):  
Thomas Glinsner ◽  
Paul Lindner ◽  
Michael Mühlberger ◽  
Iris Bergmair ◽  
Rainer Schöftner ◽  
...  

2007 ◽  
Author(s):  
Thomas Glinsner ◽  
Paul Lindner ◽  
Michael Mühlberger ◽  
Iris Bergmair ◽  
Rainer Schöftner ◽  
...  

2008 ◽  
Vol 8 (2) ◽  
pp. 535-539 ◽  
Author(s):  
V. Reboud ◽  
N. Kehagias ◽  
M. Zelsmann ◽  
M. Striccoli ◽  
M. Tamborra ◽  
...  

Highly luminescent (CdSe)ZnS nanocrystals, with band edge emission in the red region of the visible spectrum, were successfully synthesized and incorporated in a resist, namely mr-NIL 6000. The nanocomposite material was imprinted by using conventional nanoimprint lithography (NIL) process. We report on the fabrication and characterization of nanoimprinted photonic crystals in this new functional material. Experiments showed good imprint properties of the NC/polymer based material and that the surface nanostructuration improves the light extraction efficiency by over 2 compared to a nanoimprinted unpatterned surface.


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