On the relationship between the ionization potential and the work function: Metals

2002 ◽  
Vol 47 (1) ◽  
pp. 92-96 ◽  
Author(s):  
S. Yu. Davydov
2016 ◽  
Vol 44 (3) ◽  
pp. 266-279 ◽  
Author(s):  
Craig A. Warlick ◽  
Paul B. Ingram ◽  
Karen D. Multon ◽  
M. Alexandra Vuyk

Religion is a shaping force in the world today, increasingly expressed and integral to the flow and function of the workplace. The relationship between religious identity and work function is clearly present. However, no lines of research have explored how religion explains the variations in vocational interest, despite speculation that it does so. Fundamentalist beliefs provide an opportunity to examine how career interests are related to personal values. This study examined the relationship between fundamentalism and the Artistic and Investigative Realistic, Investigative, Artistic, Social, Enterprising, and Conventional types, types speculated to be most dissimilar to fundamentalism, by testing the incremental importance of religious fundamentalism beyond personality traits in the shaping of vocational interests. Results suggest that, even after controlling for variation attributed to personality, religious fundamentalism is negatively related to Artistic interests yet has no relationship to Investigative interests. Issues of diversity and implications for career counselors are discussed.


2020 ◽  
Vol 22 (44) ◽  
pp. 25593-25605
Author(s):  
Ivan Marri ◽  
Michele Amato ◽  
Matteo Bertocchi ◽  
Andrea Ferretti ◽  
Daniele Varsano ◽  
...  

Surface chemistry effects are calculated within the many body perturbation theory for Si(100), Ge(100) and SiGe surfaces.


1983 ◽  
Vol 47 (1) ◽  
pp. 87-109 ◽  
Author(s):  
Ercole L. Cavalieri ◽  
Eleanor G. Rogan ◽  
Robert W. Roth ◽  
Richard K. Saugier ◽  
Alaeddin Hakam

2006 ◽  
Vol 917 ◽  
Author(s):  
Nicolas Gaillard ◽  
Denis Mariolle ◽  
Francois Bertin ◽  
Mickael Gros-Jean ◽  
Ahmad Bsiesy

AbstractIn this letter, we report on Work Function (WF) measurements performed at deca-nanometer scale on various metals using Kelvin probe Force Microscope (KFM). We first demonstrated the relationship between the WF value and the grain crystallographic orientation by combining KFM and Electron Back Scattered Diffraction (EBSD) performed over the same Cu area. Once this relationship was established, KFM was used to provide, in addition to WF value, crystallographic properties of TiN PVD films grown on various substrates. Finally we characterized the effect of N2/H2 plasma treatment on the WF of TiN grown by CVD. In the latter case, the modification of the bulk chemical potential by post-treatment was proposed.


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