Predictions from Polar Fluid Theory Which Are Independent of Spin Boundary Condition

1975 ◽  
Vol 19 (1) ◽  
pp. 139-145 ◽  
Author(s):  
Kenneth A. Kline
Polymers ◽  
2021 ◽  
Vol 13 (7) ◽  
pp. 1072
Author(s):  
Vladimir Shelukhin

We develop a new mathematical model for rotational sedimentation of particles for steady flows of a viscoplastic granular fluid in a concentric-cylinder Couette geometry when rotation of the Couette cell inner cylinder is prescribed. We treat the suspension as a micro-polar fluid. The model is validated by comparison with known data of measurement. Within the proposed theory, we prove that sedimentation occurs due to particles’ rotation and rotational diffusion.


2006 ◽  
Vol 304-305 ◽  
pp. 359-363 ◽  
Author(s):  
J.Y. Liu ◽  
Zhu Ji Jin ◽  
Dong Ming Guo ◽  
Ren Ke Kang

The lubrication properties of the slurry between the silicon wafer and the pad in chemical mechanical polishing (CMP) are critical to the planarity of the silicon wafer. Moreover, the suspending abrasives, which are contained in the slurry, have an extremely important influence on the lubrication properties of the slurry. In the CMP process of the large-sized silicon wafers, the influence of suspending abrasives on the slurry becomes more prominent. In order to explore the effects of suspending abrasives on the lubrication properties of the slurry under the light load conditions, a three-dimensional lubrication model based on the micro-polar fluid theory is developed. The effects of suspending abrasives on the fluid pressure acting on the wafer and the distribution of the slurry film between the silicon wafer and the pad are discussed.


2016 ◽  
Vol 32 (3) ◽  
pp. 397-405 ◽  
Author(s):  
Sahra Azma ◽  
Ghader Rezazadeh ◽  
Rasoul Shabani ◽  
Elnaz Alizadeh-Haghighi

2001 ◽  
Vol 22 (5) ◽  
pp. 35-40 ◽  
Author(s):  
D. C. Look Jr ◽  
Arvind Krishnan

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