Design and optimization of large area thin-film CdTe detector for radiation therapy imaging applications

2010 ◽  
Vol 37 (8) ◽  
pp. 3980-3994 ◽  
Author(s):  
E. Ishmael Parsai ◽  
Diana Shvydka ◽  
Jun Kang
Keyword(s):  
Thin Film ◽  
Radiation Therapy ◽  
Large Area ◽  
Design And Optimization ◽  
Cdte Detector

WE-G-110-04: Finding the Optimal Thickness of Large Area Thin-Film CdTe Detector under Diagnostic X-Ray Beams

2011 ◽  
Vol 38 (6Part33) ◽  
pp. 3833-3833
Author(s):  
X Jin ◽  
D Shvydka ◽  
E Parsai
Keyword(s):  
Thin Film ◽  
Optimal Thickness ◽  
Large Area ◽  
X Ray ◽  
Cdte Detector

Theory of Vertical Amorphous Silicon Thin-Film Transistors

1989 ◽  
Vol 149 ◽  
Author(s):  
J. G. Shaw ◽  
M. Hack
Keyword(s):  
Thin Film ◽  
Amorphous Silicon ◽  
Thin Film Transistor ◽  
Channel Length ◽  
Large Area ◽  
Silicon Thin Film ◽  
Short Channel ◽  
Design And Optimization ◽  
Current Path ◽  
Output Characteristics

ABSTRACTWe describe a vertical amorphous silicon thin-film transistor which is easy to fabricate and has a very short channel length that is determined by deposition, not lithography. Our vertical TFTs are compatible with large-area processing techniques andd have suitable terminal characteristics for use in practical circuits. Unlike a conventional thin-film transistor, the current path is primarily parallel to the electric field created by an insulated gate electrode. A two-dimensional computer program is used to analyze these devices and guide their design and optimization. We show how to suppress excessive leakage currents and improve the saturation of the output characteristics by a novel current-blocking technique.

scholarly journals Amorphous thin-film oxide power devices operating beyond bulk single-crystal silicon limit

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Yuki Tsuruma ◽  
Emi Kawashima ◽  
Yoshikazu Nagasaki ◽  
Takashi Sekiya ◽  
Gaku Imamura ◽  
...  
Keyword(s):  
Thin Film ◽  
Single Crystal ◽  
Flexible Substrate ◽  
Single Crystal Silicon ◽  
Bulk Single Crystal ◽  
Next Generation ◽  
Power Devices ◽  
Large Area ◽  
Crystal Silicon ◽  
Amorphous Thin Film

AbstractPower devices (PD) are ubiquitous elements of the modern electronics industry that must satisfy the rigorous and diverse demands for robust power conversion systems that are essential for emerging technologies including Internet of Things (IoT), mobile electronics, and wearable devices. However, conventional PDs based on “bulk” and “single-crystal” semiconductors require high temperature (> 1000 °C) fabrication processing and a thick (typically a few tens to 100 μm) drift layer, thereby preventing their applications to compact devices, where PDs must be fabricated on a heat sensitive and flexible substrate. Here we report next-generation PDs based on “thin-films” of “amorphous” oxide semiconductors with the performance exceeding the silicon limit (a theoretical limit for a PD based on bulk single-crystal silicon). The breakthrough was achieved by the creation of an ideal Schottky interface without Fermi-level pinning at the interface, resulting in low specific on-resistance Ron,sp (< 1 × 10–4 Ω cm2) and high breakdown voltage VBD (~ 100 V). To demonstrate the unprecedented capability of the amorphous thin-film oxide power devices (ATOPs), we successfully fabricated a prototype on a flexible polyimide film, which is not compatible with the fabrication process of bulk single-crystal devices. The ATOP will play a central role in the development of next generation advanced technologies where devices require large area fabrication on flexible substrates and three-dimensional integration.

Vacuum processed large area doped thin-film crystals: A new approach for high-performance organic electronics

2021 ◽  
Vol 17 ◽  
pp. 100352
Author(s):  
S.-J. Wang ◽  
M. Sawatzki ◽  
H. Kleemann ◽  
I. Lashkov ◽  
D. Wolf ◽  
...  
Keyword(s):  
Thin Film ◽  
Organic Electronics ◽  
High Performance ◽  
Large Area ◽  
New Approach

Advanced large area characterization of thin-film solar modules by electroluminescence and thermography imaging techniques

2015 ◽  
Vol 135 ◽  
pp. 35-42 ◽  
Author(s):  
A. Gerber ◽  
V. Huhn ◽  
T.M.H. Tran ◽  
M. Siegloch ◽  
Y. Augarten ◽  
...  
Keyword(s):  
Thin Film ◽  
Imaging Techniques ◽  
Large Area
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