SU-FF-T-438: Modeling 6 MeV Electron Beam From Medical Linear Accelerator Using Monte Carlo Simulation

2009 ◽  
Vol 36 (6Part15) ◽  
pp. 2623-2623
Author(s):  
P Dechsupa ◽  
C Tannanonta ◽  
N Phaisangittisakul
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Linear Accelerator ◽  
Medical Linear Accelerator

Monte Carlo calculations of electron beam output factors for a medical linear accelerator

1998 ◽  
Vol 43 (12) ◽  
pp. 3479-3494 ◽  
Author(s):  
Ajay Kapur ◽  
C-M Ma ◽  
Ed C Mok ◽  
David O Findley ◽  
Arthur L Boyer
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Linear Accelerator ◽  
Monte Carlo Calculations ◽  
Medical Linear Accelerator ◽  
Beam Output ◽  
Output Factors

Monte Carlo simulation of a medical linear accelerator for radiotherapy use

2006 ◽  
Vol 119 (1-4) ◽  
pp. 506-509 ◽  
Author(s):  
B. Serrano ◽  
A. Hachem ◽  
E. Franchisseur ◽  
J. Hérault ◽  
S. Marcié ◽  
...  
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Linear Accelerator ◽  
Medical Linear Accelerator

Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Distribution ◽  
Electron Energy ◽  
Electron Beam Lithography ◽  
Energy Deposition ◽  
Si Substrate ◽  
Positive Resist

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

Ensuring the reliability of electron beam crosslinked electric cables by the optimization of the dose depth distribution with Monte Carlo simulation

2009 ◽  
Vol 49 (9-11) ◽  
pp. 972-976 ◽  
Author(s):  
Mauro Ciappa ◽  
Luigi Mangiacapra ◽  
Maria Stangoni ◽  
Stephan Ott ◽  
Wolfgang Fichtner
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Depth Distribution ◽  
Electric Cables
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