Sci-Fri AM: YIS-03: Simulated annealing optimization of the pre-target electron beam in Monte Carlo virtual linac models

2008 ◽  
Vol 35 (7Part3) ◽  
pp. 3410-3410
Author(s):  
K Bush ◽  
S Zavgorodni ◽  
W Beckham
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Simulated Annealing ◽  
Target Electron

Inference of the optimal pretarget electron beam parameters in a Monte Carlo virtual linac model through simulated annealing

2009 ◽  
Vol 36 (6Part1) ◽  
pp. 2309-2319 ◽  
Author(s):  
Karl Bush ◽  
Sergei Zavgorodni ◽  
Wayne Beckham
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Simulated Annealing ◽  
Beam Parameters

Monte Carlo analysis of the NEO Beam electron beam facility

2010 ◽  
Author(s):  
S. R. Messenger ◽  
J. H. Warner ◽  
K. Trautz ◽  
R. Uribe ◽  
R. J. Walters
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Monte Carlo Analysis ◽  
Beam Electron

Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Distribution ◽  
Electron Energy ◽  
Electron Beam Lithography ◽  
Energy Deposition ◽  
Si Substrate ◽  
Positive Resist

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

Ensuring the reliability of electron beam crosslinked electric cables by the optimization of the dose depth distribution with Monte Carlo simulation

2009 ◽  
Vol 49 (9-11) ◽  
pp. 972-976 ◽  
Author(s):  
Mauro Ciappa ◽  
Luigi Mangiacapra ◽  
Maria Stangoni ◽  
Stephan Ott ◽  
Wolfgang Fichtner
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Depth Distribution ◽  
Electric Cables
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