Electron beam collimation with focused and curved leaf end MLCs-Experimental verification of Monte Carlo optimized designs

2002 ◽  
Vol 29 (4) ◽  
pp. 631-637 ◽  
Author(s):  
Magnus G. Karlsson ◽  
Mikael Karlsson
Author(s):  
S. R. Messenger ◽  
J. H. Warner ◽  
K. Trautz ◽  
R. Uribe ◽  
R. J. Walters

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.


2009 ◽  
Vol 49 (9-11) ◽  
pp. 972-976 ◽  
Author(s):  
Mauro Ciappa ◽  
Luigi Mangiacapra ◽  
Maria Stangoni ◽  
Stephan Ott ◽  
Wolfgang Fichtner

2001 ◽  
Vol 58 (2) ◽  
pp. 179-185 ◽  
Author(s):  
Magnolia Rincón ◽  
Francisco Sánchez-Doblado ◽  
Maria Perucha ◽  
Antonio Leal ◽  
Rafael Arráns ◽  
...  

2013 ◽  
Vol 58 (17) ◽  
pp. 6047-6064 ◽  
Author(s):  
Ryohei Tansho ◽  
Yoshihisa Takada ◽  
Ryosuke Kohno ◽  
Kenji Hotta ◽  
Yousuke Hara ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document