Resolution Enhancement Techniques in Optical Lithography

Resolution enhancement techniques for optical lithography and optical imaging theory

Optical Review ◽

10.1007/bf02931670 ◽

1997 ◽

Vol 4 (1) ◽

pp. 151-160 ◽

Cited By ~ 6

Author(s):

Masato Shibuya

Keyword(s):

Optical Imaging ◽

Resolution Enhancement ◽

Optical Lithography ◽

Imaging Theory

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Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography

Journal of Micro/Nanolithography MEMS and MOEMS ◽

10.1117/1.jmm.19.4.043201 ◽

2020 ◽

Vol 19 (04) ◽

Author(s):

Manabu Hakko ◽

Kanji Suzuki

Keyword(s):

Resolution Enhancement ◽

Optical Lithography

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Limitation of optical lithography for various resolution enhancement technologies

10.1117/12.474545 ◽

2002 ◽

Author(s):

Tae-Seung Eom ◽

Chang-Nam Ahn ◽

Dong-Heok Park ◽

Cha-Won Koh ◽

Cheol-Kyu Bok

Keyword(s):

Resolution Enhancement ◽

Optical Lithography ◽

Enhancement Technologies

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Lithographic Materials Technologies: 193 nm Imaging and Beyond

MRS Proceedings ◽

10.1557/proc-584-23 ◽

1999 ◽

Vol 584 ◽

Author(s):

Elsa Reichmanis ◽

Omkaram Nalamasu ◽

Francis M. Houlihan ◽

Allen H. Gabor ◽

Mark O. Neisser ◽

...

Keyword(s):

Resolution Enhancement ◽

Electronics Industry ◽

Optical Lithography ◽

Design Rule ◽

Chemically Amplified ◽

Chemically Amplified Resist ◽

193 Nm ◽

Productivity Gains

AbstractAdvances in microlithographic resist materials have been a key enabler of the unabated productivity gains in the electronics industry and are continuing to help push the ultimate limits of optical lithography. The challenges posed by the introduction of new optical lithography technologies that use smaller wavelengths have been successfully met by the materials community through the design of chemically amplified resist technologies and 193 nm resist materials based on aliphatic polymers and dissolution inhibitors. With continued advances in resist materials, exposure systems and resolution enhancement and mask technologies, optical lithography will be capable of patterning ≤ 0.1 μm design rule devices in future fabs.

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