Radical and Molecular Product Concentration Measurements in CF 4 RF Plasmas by Infrared Tunable Diode Laser Absorption RF plasmas by infrared tunable diode laser absorption

1990 ◽  
Author(s):  
J. Wormhoudt
Keyword(s):  
Diode Laser ◽  
Tunable Diode Laser ◽  
Product Concentration ◽  
Rf Plasmas ◽  
Laser Absorption ◽  
Molecular Product ◽  
Concentration Measurements ◽  
Diode Laser Absorption

Radical and Molecular Product Concentration Measurements in CH4 RF Plasmas by Infrared Tunable Diode Laser Absorption

1989 ◽  
Vol 165 ◽  
Author(s):  
J. Wormhoudt
Keyword(s):  
Diode Laser ◽  
Rotational Temperature ◽  
Tunable Diode Laser ◽  
Rf Plasmas ◽  
Laser Absorption ◽  
Molecular Product ◽  
Absorption Studies ◽  
Concentration Measurements ◽  
Laboratory Reactor ◽  
Diode Laser Absorption

AbstractInfrared tunable diode laser absorption studies of radicals and stable molecules formed in radio frequency plasmas are being carried out in a laboratory reactor which allows a long absorption path. In this paper we describe studies of CH4 RF plasmas. We report absolute concentration measurements as functions of total pressure and RF power for CH3 and C2H2 in CH4 plasmas, as well as measurements of the CH4 rotational temperature and dissociation fraction.

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