A New Mid-UV Resist With Oxygen Plasma Resistance

1989 ◽  
Author(s):  
J. M. Liu ◽  
C. H. Tzeng
Keyword(s):  
Oxygen Plasma ◽  
Plasma Resistance

Photochemical generation of polysiloxane surfaces on polymers, and subsequent oxygen plasma resistance

1993 ◽  
Vol 3 (2) ◽  
pp. 133 ◽  
Author(s):  
Masamitsu Shirai ◽  
Takahiro Miwa ◽  
Tomonobu Sumino ◽  
Masahiro Tsunooka
Keyword(s):  
Oxygen Plasma ◽  
Photochemical Generation ◽  
Plasma Resistance

Enhancing the Oxygen Plasma Resistance of Low-kMethylsilsesquioxane by H2Plasma Treatment

1999 ◽  
Vol 38 (Part 1, No. 6A) ◽  
pp. 3482-3486 ◽  
Author(s):  
Po-Tsun Liu ◽  
Ting-Chang Chang ◽  
Yi-Shian Mor ◽  
Simon M. Sze
Keyword(s):  
Oxygen Plasma ◽  
Plasma Resistance

Oxygen Plasma Resistance of Low-k Organosilica Glass Films

2001 ◽  
Vol 4 (3) ◽  
pp. G31 ◽  
Author(s):  
Takeshi Furusawa ◽  
Daisuke Ryuzaki ◽  
Ryo Yoneyama ◽  
Yoshio Homma ◽  
Kenji Hinode
Keyword(s):  
Oxygen Plasma ◽  
Plasma Resistance ◽  
Low K ◽  
Glass Films

Resist Materials Utilizing Oxygen Plasma Resistance of Iodine Compounds

1985 ◽  
Vol 132 (5) ◽  
pp. 1168-1171 ◽  
Author(s):  
Takumi Ueno ◽  
Hiroshi Shiraishi ◽  
Takao Iwayanagi ◽  
Saburo Nonogaki
Keyword(s):  
Oxygen Plasma ◽  
Plasma Resistance ◽  
Iodine Compounds

Etching of Polymers by Oxygen Plasma

1968 ◽  
Vol 26 ◽  
pp. 408-409
Author(s):  
Virgil Peck ◽  
W. L. Carter
Keyword(s):  
Molecular Weight ◽  
Oxygen Plasma ◽  
Flow Time ◽  
Microscopical Study ◽  
Surface Layers ◽  
Organic Vapors ◽  
Sample Position ◽  
Accuracy Of Measurement ◽  
Bulk Polymers ◽  
Electron Microscopical

Any electron microscopical study of the morphology of bulk polymers has throughout the years been hampered by the lack of any real ability to produce meaningful surface variations for replication. True etching of polymers should show crystalline and amorphous regions in some form of relief. The use of solvents, acids, organic vapors, and inert ion bombardment to etch samples has proved to be useful only in limited applications. Certainly many interpretations of these results are subject to question.The recent use of a radiofrequency (R. F.) plasma of oxygen to degrade and remove organic material with only minor heating has opened a new possibility for etching polymers. However, rigid control of oxygen flow, time, current, and sample position are necessary in order to obtain reproducible results. The action is confined to surface layers; the molecular weight of the polymer residue after heavy etching is the same as the molecular weight of the polymer before attack, within the accuracy of measurement.

Activation of EL-4 T-cells by irradiation with atmospheric oxygen plasma

2020 ◽  
Vol 59 (SJ) ◽  
pp. SJJF03
Author(s):  
Sitti Subaedah ◽  
Haruka Uematsu ◽  
Nobuya Hayashi
Keyword(s):  
T Cells ◽  
Oxygen Plasma ◽  
Atmospheric Oxygen

Diagnostics of hydrogen-oxygen plasma jet for application in gas thermal spraying

2020 ◽  
Vol 2020 (11) ◽  
pp. 41-45
Author(s):  
Yu.S. Popil ◽  
◽  
V.M. Korzh ◽  
V.Ya. Chernyak ◽  
Ye.A. Zakharov ◽  
...  
Keyword(s):  
Oxygen Plasma ◽  
Thermal Spraying ◽  
Plasma Jet
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