A New Device Architecture Suitable For High-Resolution And High-Performance Image Sensors

1989 ◽  
Author(s):  
Jerry Hynecek
2020 ◽  
Vol 117 (17) ◽  
pp. 173102
Author(s):  
Masaaki Shimatani ◽  
Shoichiro Fukushima ◽  
Satoshi Okuda ◽  
Shinpei Ogawa

Author(s):  
Jyoti Prakash Patra ◽  
Puru Agrawal

PureView Technology is the combination of a super high-resolution image sensor and high-performance optics. It further applies advanced image processing algorithms and pixel oversampling to give the best quality outputs. It uses pixel oversampling method. Pixel oversampling combines many pixels to create a single (super) pixel. When this happens, we keep virtually all the details but filter away visual noise from the image. The speckled, grainy look we tend to get in low-lighting conditions is greatly reduced. One of the major benefits of this technology is loss-less zoom. The level of pixel oversampling is highest when we are not using the zoom. It gradually decreases until we hit maximum zoom, where there is no oversampling. This technique thus allows us to have loss-less zooms even when we are using the camera for taking zoomed in photos. The core of this technology lies somewhere in the satellite imagery system which uses a similar method of pixel oversampling and high-resolution image sensors. With PureView, uses a system called oversampling, which takes the original greater number of megapixels captured with the enormous sensor and reduces them to a high-quality image consisting of only a few megapixels. Pixels are pulled together into groups of seven and those seven pixels are then condensed into one, so that even though the resulting photograph is only a few megapixel images it is of a better quality than those captured with more traditional five megapixel cameras. For example, Nokia Lumia 1020 uses a 41-megapixel camera to take the original image, however, reduces this to only an output of 5 megapixels. This thus produces a


Author(s):  
K. Ogura ◽  
H. Nishioka ◽  
N. Ikeo ◽  
T. Kanazawa ◽  
J. Teshima

Structural appraisal of thin film magnetic media is very important because their magnetic characters such as magnetic hysteresis and recording behaviors are drastically altered by the grain structure of the film. However, in general, the surface of thin film magnetic media of magnetic recording disk which is process completed is protected by several-nm thick sputtered carbon. Therefore, high-resolution observation of a cross-sectional plane of a disk is strongly required to see the fine structure of the thin film magnetic media. Additionally, observation of the top protection film is also very important in this field.Recently, several different process-completed magnetic disks were examined with a UHR-SEM, the JEOL JSM 890, which consisted of a field emission gun and a high-performance immerse lens. The disks were cut into approximately 10-mm squares, the bottom of these pieces were carved into more than half of the total thickness of the disks, and they were bent. There were many cracks on the bent disks. When these disks were observed with the UHR-SEM, it was very difficult to observe the fine structure of thin film magnetic media which appeared on the cracks, because of a very heavy contamination on the observing area.


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