Anisotropic Plasma Etching Of Polysilicon With 100:1 Selectivity Over Thermal Oxide

1984 ◽  
Author(s):  
D.Bhogeswara Rao
Keyword(s):  
Plasma Etching ◽  
Anisotropic Plasma ◽  
Thermal Oxide

Development of Backside Scanning Capacitance Microscopy Technique for Advanced SOI Microprocessors

2006 ◽  
Author(s):  
Vinod Narang ◽  
P. Muthu ◽  
J.M. Chin ◽  
Vanissa Lim
Keyword(s):  
Plasma Etching ◽  
Data Interpretation ◽  
Parameters Optimization ◽  
Scanning Capacitance Microscopy ◽  
Microscopy Technique ◽  
Thermal Oxide ◽  
Specific Analysis ◽  
Thin Oxide ◽  
P Type ◽  
Uv Ozone

Abstract Implant related issues are hard to detect with conventional techniques for advanced devices manufactured with deep sub-micron technology. This has led to introduction of site-specific analysis techniques. This paper presents the scanning capacitance microscopy (SCM) technique developed from backside of SOI devices for packaged products. The challenge from backside method includes sample preparation methodology to obtain a thin oxide layer of high quality, SCM parameters optimization and data interpretation. Optimization of plasma etching of buried oxide followed by a new method of growing thin oxide using UV/ozone is also presented. This oxidation method overcomes the limitations imposed due to packaged unit not being able to heat to high temperature for growing thermal oxide. Backside SCM successfully profiled both the n and p type dopants in both cache and core transistors.

Understanding Anisotropic Plasma Etching of Two-Dimensional Polystyrene Opals for Advanced Materials Fabrication

Langmuir ◽  
2014 ◽  
Vol 30 (41) ◽  
pp. 12354-12361 ◽  
Author(s):  
Eser M. Akinoglu ◽  
Anthony J. Morfa ◽  
Michael Giersig
Keyword(s):  
Plasma Etching ◽  
Anisotropic Plasma ◽  
Advanced Materials ◽  
Two Dimensional

Anisotropic plasma etching of polysilicon

1980 ◽  
Vol 17 (3) ◽  
pp. 721-730 ◽  
Author(s):  
C. J. Mogab ◽  
H. J. Levinstein
Keyword(s):  
Plasma Etching ◽  
Anisotropic Plasma

Performance enhancement of IPMC by anisotropic plasma etching process

2009 ◽  
Author(s):  
Seok Hwan Lee ◽  
Chul-Jin Kim ◽  
Hyun-Woo Hwang ◽  
Sung-Joo Kim ◽  
Hyun-Seok Yang ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Performance Enhancement ◽  
Anisotropic Plasma ◽  
Etching Process ◽  
Plasma Etching Process

High-throughput anisotropic plasma etching of polyimide for MEMS

2011 ◽  
Vol 21 (6) ◽  
pp. 067003 ◽  
Author(s):  
Vladimir Bliznetsov ◽  
Anbumalar Manickam ◽  
Junwei Chen ◽  
Nagarajan Ranganathan
Keyword(s):  
High Throughput ◽  
Plasma Etching ◽  
Anisotropic Plasma

High-etch-rate deep anisotropic plasma etching of silicon for MEMS fabrication

1998 ◽  
Author(s):  
Tam Pandhumsoporn ◽  
Lei Wang ◽  
Michael Feldbaum ◽  
Prashant Gadgil ◽  
Michel Puech ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Etch Rate ◽  
Anisotropic Plasma ◽  
Mems Fabrication ◽  
High Etch Rate

Anisotropic plasma etching of polymers using a cryo-cooled resist mask

2000 ◽  
Vol 18 (2) ◽  
pp. 385-387 ◽  
Author(s):  
B. Schüppert ◽  
E. Brose ◽  
K. Petermann ◽  
R. Moosburger
Keyword(s):  
Plasma Etching ◽  
Anisotropic Plasma
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