The assessment of the impact of mask pattern shape variation on the OPC-modeling by using SEM-contours from wafer and mask
2020 ◽
2011 ◽
Vol 291-294
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pp. 3097-3102
Keyword(s):
2017 ◽
Keyword(s):
2004 ◽
Vol 287
(4)
◽
pp. H1836-H1841
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Keyword(s):