Verification of the controllability of refractive index by subwavelength structure fabricated by photolithography: toward single-material mid- and far-infrared multilayer filters
Keyword(s):
1973 ◽
Vol 6
(6)
◽
pp. 774-780
◽
1976 ◽
pp. 257-262
1978 ◽
Vol 87
(1)
◽
pp. K65-K67
◽