Characteristic three-dimensional structure of resist's distribution after drying a resist solution coated on a flat substrate: analysis using the extended dynamical model of the drying process
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1987 ◽
Vol 45
◽
pp. 650-651
1987 ◽
Vol 45
◽
pp. 633-635
1990 ◽
Vol 48
(1)
◽
pp. 282-283