Porous silicon near room temperature nanosensor covered by TiO 2 or ZnO thin films

Author(s):  
Vladimir M. Aroutiounian ◽  
Valery M. Arakelyan ◽  
Vardan Galstyan ◽  
Khachatur Martirosyan ◽  
Patrick Soukiassian
2015 ◽  
Vol 117 (17) ◽  
pp. 17B901 ◽  
Author(s):  
Yu-Min Hu ◽  
Sih-Sian Li ◽  
Chein-Hsiun Kuang ◽  
Tai-Chun Han ◽  
Chin-Chung Yu

2007 ◽  
Vol 102 (3) ◽  
pp. 033905 ◽  
Author(s):  
D. L. Hou ◽  
X. J. Ye ◽  
X. Y. Zhao ◽  
H. J. Meng ◽  
H. J. Zhou ◽  
...  

2009 ◽  
Vol 70 (6) ◽  
pp. 967-971 ◽  
Author(s):  
Hong Cai ◽  
Honglie Shen ◽  
Yugang Yin ◽  
Linfeng Lu ◽  
Jiancang Shen ◽  
...  

2019 ◽  
Vol 130 ◽  
pp. 321-331 ◽  
Author(s):  
C.C. Okorieimoh ◽  
Ugochi Chime ◽  
Agnes C. Nkele ◽  
Assumpta C. Nwanya ◽  
Itani Given Madiba ◽  
...  

2013 ◽  
Vol 2013 ◽  
pp. 1-6 ◽  
Author(s):  
M. Acosta ◽  
I. Riech ◽  
E. Martín-Tovar

Zinc oxide (ZnO) thin films were grown by nonreactive RF sputtering at room temperature under varying argon pressures (PAr). Their optical band gap was found to increase from 3.58 to 4.34 eV when the argon pressure increases from 2.67 to 10.66 Pa. After annealing at 200°C and 500°C, optical band gaps decrease considerably. The observed widening of the band gap with increasingPArcan be understood as being a consequence of the poorer crystallinity of films grown at higher pressures. Measurements of morphological and electrical properties of these films correlate well with this picture. Our main aim is to understand the effects ofPAron several physical properties of the films, and most importantly on its optical band gap.


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