Comparative study of simulations and experiments for contact array patterns on attenuated phase shifting mask

2005 ◽  
Author(s):  
Thomas Henkel ◽  
Martin Sczyrba ◽  
Christoph Noelscher
Keyword(s):  
Comparative Study ◽  
Phase Shifting

Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography

2006 ◽  
Author(s):  
Masaki Yoshizawa ◽  
Vicky Philipsen ◽  
Leonardus H. A. Leunissen ◽  
Eric Hendrickx ◽  
Rik Jonckheere ◽  
...  
Keyword(s):  
Comparative Study ◽  
Phase Shifting

Phase-shifting methodologies in photoelastic analysis—the application of Jones calculus

1996 ◽  
Vol 31 (6) ◽  
pp. 423-432 ◽  
Author(s):  
K Ramesh ◽  
V Ganapathy
Keyword(s):  
Image Processing ◽  
Stress Concentration ◽  
Data Collection ◽  
Comparative Study ◽  
Digital Image Processing ◽  
Digital Image ◽  
Phase Shifting ◽  
Intensity Data ◽  
New Approach ◽  
Photoelastic Analysis

The potential of digital image processing hardware to record intensity data at video rates has resulted in a new approach for data collection. Efforts were aimed at evaluating isochromatic and isoclinic fringe orders quantitatively by processing the intensity data recorded. These methodologies have come to be known as phase-shifting techniques. The various phase-shifting algorithms in photoelasticity are surveyed and a comparative study is done. The use of Jones calculus to understand these methodologies is brought out. An attempt has been made to identify the reason for loss of accuracy in evaluating the field parameters in stress concentration zones.

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