Developing an understanding of electron beam imaging of deep contact hole structures using Monte Carlo and spatial charge distribution simulations

2005 ◽  
Author(s):  
Neal Sullivan ◽  
Byoung H. Lee ◽  
Yeong-Uk Ko
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Charge Distribution ◽  
Spatial Charge

Measurements and simulation of the spatial charge distribution in electron‐beam‐irradiated polymers

1989 ◽  
Vol 65 (3) ◽  
pp. 1147-1151 ◽  
Author(s):  
T. Maeno ◽  
T. Futami ◽  
H. Kushibe ◽  
T. Takada
Keyword(s):  
Electron Beam ◽  
Charge Distribution ◽  
Spatial Charge

Monte Carlo analysis of the NEO Beam electron beam facility

2010 ◽  
Author(s):  
S. R. Messenger ◽  
J. H. Warner ◽  
K. Trautz ◽  
R. Uribe ◽  
R. J. Walters
Keyword(s):  
Monte Carlo ◽  
Electron Beam ◽  
Monte Carlo Analysis ◽  
Beam Electron

Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Distribution ◽  
Electron Energy ◽  
Electron Beam Lithography ◽  
Energy Deposition ◽  
Si Substrate ◽  
Positive Resist

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

scholarly journals Monte Carlo simulations of a hydrophobic weak polyelectrolyte. Charge distribution as a function of conformation

1993 ◽  
Vol 99 (5) ◽  
pp. 4231-4232 ◽  
Author(s):  
J. L. F. Abascal ◽  
Alexander P. Sassi ◽  
Harvey W. Blanch ◽  
John M. Prausnitz
Keyword(s):  
Monte Carlo ◽  
Monte Carlo Simulations ◽  
Charge Distribution

Ensuring the reliability of electron beam crosslinked electric cables by the optimization of the dose depth distribution with Monte Carlo simulation

2009 ◽  
Vol 49 (9-11) ◽  
pp. 972-976 ◽  
Author(s):  
Mauro Ciappa ◽  
Luigi Mangiacapra ◽  
Maria Stangoni ◽  
Stephan Ott ◽  
Wolfgang Fichtner
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Depth Distribution ◽  
Electric Cables
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