The sidewall angle dependence of CDSEM measurements and its impact on CD process control

2005 ◽  
Author(s):  
Justin J. Hwu ◽  
Homayoun Kiamanesh ◽  
Sukhbir Dulay ◽  
Peter Wilkens
Keyword(s):  
Process Control ◽  
Angle Dependence ◽  
Sidewall Angle

Scattering-angle dependence of signal/background ratio of inner-shell electron excitation loss in EELS

1983 ◽  
Vol 41 ◽  
pp. 390-391
Author(s):  
T. Oikawa ◽  
M. Inoue ◽  
T. Honda ◽  
Y. Kokubo
Keyword(s):  
Energy Loss ◽  
Electron Excitation ◽  
Heavy Elements ◽  
Background Intensity ◽  
Light Elements ◽  
Energy Analyzer ◽  
High Background ◽  
Scattering Angle ◽  
Angle Dependence ◽  
Shell Electron

EELS allows us to make analysis of light elements such as hydrogen to heavy elements of microareas on the specimen. In energy loss spectra, however, elemental signals ride on a high background; therefore, the signal/background (S/B) ratio is very low in EELS. A technique which collects the center beam axial-symmetrically in the scattering angle is generally used to obtain high total intensity. However, the technique collects high background intensity together with elemental signals; therefore, the technique does not improve the S/B ratio. This report presents the experimental results of the S/B ratio measured as a function of the scattering angle and shows the possibility of the S/B ratio being improved in the high scattering angle range.Energy loss spectra have been measured using a JEM-200CX TEM with an energy analyzer ASEA3 at 200 kV.Fig.l shows a typical K-shell electron excitation edge riding on background in an energy loss spectrum.

INSTRUMENTATION - Mass Spectrometry Process Control

1956 ◽  
Vol 48 (2) ◽  
pp. 81-84
Author(s):  
William Priestley ◽  
B. Dudenbostel, Jr.
Keyword(s):  
Mass Spectrometry ◽  
Process Control

FTIR based process control for industrial reactors

1999 ◽  
Vol 09 (PR8) ◽  
pp. Pr8-995-Pr8-1002 ◽  
Author(s):  
V. Hopfe ◽  
W. Grählert ◽  
O. Throl
Keyword(s):  
Process Control

PROTECTIVE CVD COATINGS FOR THE TOOL INDUSTRY : REQUIREMENTS FOR PROCESS CONTROL AND EQUIPMENT

1989 ◽  
Vol 50 (C5) ◽  
pp. C5-433-C5-433
Author(s):  
E. MOHN ◽  
R. BONETTI ◽  
H. WIPRÄCHTIGER
Keyword(s):  
Process Control
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