Computer simulations of laser-target interaction during pulsed laser deposition

2004 ◽  
Author(s):  
Bogdan Nastase ◽  
Ion N. Mihailescu
Keyword(s):  
Pulsed Laser Deposition ◽  
Computer Simulations ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Laser Target ◽  
Target Interaction

Laser-target interaction during high-power pulsed laser deposition of superconducting thin films

2007 ◽  
Vol 204 (12) ◽  
pp. 4241-4248 ◽  
Author(s):  
Ranran Fang ◽  
Duanming Zhang ◽  
Zhihua Li ◽  
Li Li ◽  
Xinyu Tan ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
High Power ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Superconducting Thin Films ◽  
Laser Target ◽  
Target Interaction

Laser‐target interactions during pulsed laser deposition of superconducting thin films

1991 ◽  
Vol 70 (10) ◽  
pp. 5433-5439 ◽  
Author(s):  
Deepika Bhattacharya ◽  
R. K. Singh ◽  
P. H. Holloway
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Superconducting Thin Films ◽  
Laser Target

Novel Materials Applications of Pulsed Laser Deposition

MRS Bulletin ◽  
1992 ◽  
Vol 17 (2) ◽  
pp. 44-53 ◽  
Author(s):  
Catherine M. Cotell ◽  
Kenneth S. Grabowski
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ferroelectric Materials ◽  
Laser Deposition ◽  
Laser Target ◽  
Thin Film Fabrication ◽  
Superconducting Oxides ◽  
Multicomponent Oxides

The successful use of pulsed laser deposition (PLD) to fabricate thin film superconductors has generated interest in using the technique to deposit thin films of other materials. The compositional fidelity between laser target and deposited film and the ability to deposit films in reactive gas environments make the PLD process particularly well suited to the deposition of complex multicomponent materials. Cheung and Sankur recently provided an excellent review of the PLD field, including a table of over 100 elements, inorganic and organic compounds, andsuperlattices that have been laser evaporated. Over 75 of these materials were deposited as thin films.The goal of this article is to provide an introduction to some of the newer applications of PLD for thin film fabrication. Four classes of materials are highlighted: ferroelectrics, bioceramics, ferrites, and tribological materials. Ferroelectric materials are structurally related to the high-temperature superconducting oxides and therefore are a direct extension of the recent superconducting oxide work. Bioceramics are dissimilar in structure and application to both ferroelectrics and superconducting oxides, but they are complex multicomponent oxides and, therefore, benefit from the use of PLD. Ferrites, also complex, multicomponent oxides, represent another exciting, but only lightly explored opportunity for PLD. In contrast, tribological materials are typically neither complex nor multicomponent. Nevertheless, interesting structures and properties have been produced by PLD. A few of the more important ones will be discussed. These different types of materials demonstrate the diversity of capabilities offered by PLD.

Pulsed Laser Deposition as a Novel Growth Technique of Multiferroic LuFe2O4 Thin Films

2009 ◽  
Vol 1199 ◽  
Author(s):  
Jason Rejman ◽  
Tara Dhakal ◽  
Pritish Mukherjee ◽  
Hariharan Srikanth ◽  
Sarath Witanachchi
Keyword(s):  
Thin Film ◽  
Free Energy ◽  
Pulsed Laser Deposition ◽  
Gibbs Free Energy ◽  
Pulsed Laser ◽  
Magnetic Behavior ◽  
Laser Deposition ◽  
Laser Target ◽  
Growth Environment ◽  
Data Yield

AbstractGrowth of polycrystalline Lutetium Iron Oxide via pulsed laser deposition in thin film form is reported for the first time herein, and the multiferroic LuFe2O4 phase is stabilized. Fluence and pressure dependent phase growth is demonstrated, along with crystalline structure in vacuum (˜10-5 torr) conditions. Thermodynamic considerations at the laser-target interaction were investigated, as well as at the plume-substrate interface, which reveal that the necessary Gibbs free energy is available in the optimized growth environment to allow formation of the LuFe2O4 polycrystalline phase. The resulting growth rate is found to be related to the Gibbs free energy and concentration of nucleation sites on the substrate. Characterization of the multiferroic aspect of LuFe2O4 entailed direct measurement of the ferroelectricity in the thin film, as well as magnetic behavior, both at various temperatures. In particular, the ferroelectric polarization vs. voltage data yield values of 0.61 μC/cm2 at 300 K to 3.29 μC/cm2 at 183 K; moreover, these data are in agreement with those reported in the literature. Magnetization vs. applied field data shows the magnetization at 300 K to be 180 emu/cm3 and increasing to 200 emu/cm3 at 10 K.

Microanalysis of silicate glass films grown on α-Al2O3 by pulsed-laser deposition

1993 ◽  
Vol 51 ◽  
pp. 438-439
Author(s):  
Michael P. Mallamaci ◽  
James Bentley ◽  
C. Barry Carter
Keyword(s):  
Liquid Phase ◽  
Single Crystal ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ceramic Materials ◽  
Laser Deposition ◽  
Triple Junctions ◽  
Ion Milling ◽  
Multicomponent Oxides ◽  
Glass Films

Glass-oxide interfaces play important roles in developing the properties of liquid-phase sintered ceramics and glass-ceramic materials. Deposition of glasses in thin-film form on oxide substrates is a potential way to determine the properties of such interfaces directly. Pulsed-laser deposition (PLD) has been successful in growing stoichiometric thin films of multicomponent oxides. Since traditional glasses are multicomponent oxides, there is the potential for PLD to provide a unique method for growing amorphous coatings on ceramics with precise control of the glass composition. Deposition of an anorthite-based (CaAl2Si2O8) glass on single-crystal α-Al2O3 was chosen as a model system to explore the feasibility of PLD for growing glass layers, since anorthite-based glass films are commonly found in the grain boundaries and triple junctions of liquid-phase sintered α-Al2O3 ceramics.Single-crystal (0001) α-Al2O3 substrates in pre-thinned form were used for film depositions. Prethinned substrates were prepared by polishing the side intended for deposition, then dimpling and polishing the opposite side, and finally ion-milling to perforation.

Pulsed laser deposition of relaxor ferroelectric films

1998 ◽  
Vol 08 (PR9) ◽  
pp. Pr9-261-Pr9-264
Author(s):  
M. Tyunina ◽  
J. Levoska ◽  
A. Sternberg ◽  
V. Zauls ◽  
M. Kundzinsh ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Relaxor Ferroelectric ◽  
Laser Deposition ◽  
Ferroelectric Films

Pulsed laser deposition of PbMg1/3Nb2/3O3 thin films and PbMg1/3Nb2/3O3/PbTiO3 multilayers

2001 ◽  
Vol 11 (PR11) ◽  
pp. Pr11-65-Pr11-69
Author(s):  
N. Lemée ◽  
H. Bouyanfif ◽  
J. L. Dellis ◽  
M. El Marssi ◽  
M. G. Karkut ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition

SrBi2Nb2O9 ferroelectric thin films deposited by pulsed laser deposition on textured and epitaxied platinum electrodes

2001 ◽  
Vol 11 (PR11) ◽  
pp. Pr11-133-Pr11-137
Author(s):  
J. R. Duclère ◽  
M. Guilloux-Viry ◽  
A. Perrin ◽  
A. Dauscher ◽  
S. Weber ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Ferroelectric Thin Films ◽  
Laser Deposition ◽  
Platinum Electrodes

Microstructural and Electrical Characterization of Barium Strontium Titanatebased Solid Solution Thin Films Deposited on Ceramic Substrates by Pulsed Laser Deposition

2002 ◽  
Vol 720 ◽  
Author(s):  
Costas G. Fountzoulas ◽  
Daniel M. Potrepka ◽  
Steven C. Tidrow
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Electrical Characterization ◽  
Field Variable ◽  
Laser Deposition ◽  
X Ray Diffraction ◽  
Ceramic Substrates ◽  
Nominal Thickness

AbstractFerroelectrics are multicomponent materials with a wealth of interesting and useful properties, such as piezoelectricity. The dielectric constant of the BSTO ferroelectrics can be changed by applying an electric field. Variable dielectric constant results in a change in phase velocity in the device allowing it to be tuned in real time for a particular application. The microstructure of the film influences the electronic properties which in turn influences the performance of the film. Ba0.6Sr0.4Ti1-y(A 3+, B5+)yO3 thin films, of nominal thickness of 0.65 μm, were synthesized initially at substrate temperatures of 400°C, and subsequently annealed to 750°C, on LaAlO3 (100) substrates, previously coated with LaSrCoO conductive buffer layer, using the pulsed laser deposition technique. The microstructural and physical characteristics of the postannealed thin films have been studied using x-ray diffraction, scanning electron microscopy, and nano indentation and are reported. Results of capacitance measurements are used to obtain dielectric constant and tunability in the paraelectric (T>Tc) regime.

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