Optical elements with subwavelength structured surfaces

2004 ◽  
Author(s):  
Hisao Kikuta ◽  
Hiroshi Toyota ◽  
Wanji Yu ◽  
Akio Mizutani ◽  
Koichi Iwata
Keyword(s):  
Optical Elements ◽  
Structured Surfaces

Optical Elements with Subwavelength Structured Surfaces

2003 ◽  
Vol 10 (2) ◽  
pp. 63-73 ◽  
Author(s):  
Hisao Kikuta ◽  
Hiroshi Toyota ◽  
Wanji Yu
Keyword(s):  
Optical Elements ◽  
Structured Surfaces

Subwavelength Structured Optical Elements and Resonant Grating Filters

2003 ◽  
Vol 797 ◽  
Author(s):  
Hisao Kikuta ◽  
Koichi Iwata
Keyword(s):  
Narrow Band ◽  
Optical Switch ◽  
Camera System ◽  
Radiation Mode ◽  
Optical Elements ◽  
Structured Surfaces ◽  
Guided Mode ◽  
Resonant Grating ◽  
Wavelength Filters ◽  
Polarization Camera

ABSTRACTWe developed several optical elements with subwavelength-structured surfaces. Antireflection surfaces were fabricated on a diffraction grating. A micro-retarder array realized by the form-birefringent effect has been made for an application to a polarization camera system. And we developed narrow-band reflection wavelength filters called “guided-mode resonant grating filters”. This filter bases on a coupling of guided mode and radiation mode. After describing some examples of the filters, we mention a grating structure for an optical switch with nonlinear optical material.

scholarly journals Micro-Injection Molding of Diffractive Structured Surfaces

2021 ◽  
Vol 5 (1) ◽  
pp. 12
Author(s):  
Ann-Katrin Boinski ◽  
Barnabas Adam ◽  
Arne Vogelsang ◽  
Lars Schönemann ◽  
Oltmann Riemer ◽  
...  
Keyword(s):  
Injection Molding ◽  
High Performance ◽  
Mold Insert ◽  
Diamond Turning ◽  
Micro Injection Molding ◽  
Replication Process ◽  
Optical Elements ◽  
Process Step ◽  
Structured Surfaces ◽  
Laser Lithography

In recent years, the use of highly functional optical elements has made its way into our everyday life. Its applications range from use in utility items such as cell phone cameras up to security elements on banknotes or production goods. For this purpose, the Leibniz Institute for Materials Engineering (IWT) has been developing a cutting process for the fast and cost-effective production of hologram-based diffractive optical elements. In contrast to established non-mechanical manufacturing processes, such as laser lithography or chemical etching, which are able to produce optics in large quantities and with high accuracy, the diamond turning approach is extending these properties by offering several degrees of freedom. This allows for an almost unlimited geometric complexity and a structured area of considerable size (several tenth square millimeters), achieved in a single process step. In order to introduce diffractive security features to the mass market and to actual production goods, a high-performance replication process is required as the consecutive development step. Micro injection molding represents a feasible and promising option here. In particular, diamond machining enables the integration of safety features directly into the mold insert. Not only does this make additional assembly obsolete, but the safety feature can also be placed inconspicuously in the final product. In this paper, the potential of micro-injection molding as a replication process for diffractive structured surfaces will be investigated and demonstrated. Furthermore, the optical functionality after replication will be verified and evaluated.

scholarly journals Inverse design of photonic meta-structure for beam collimation in on-chip sensing

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Robin Singh ◽  
Yuqi Nie ◽  
Mingye Gao ◽  
Anuradha Murthy Agarwal ◽  
Brian W. Anthony
Keyword(s):  
Optical Excitation ◽  
Descent Method ◽  
Design Approach ◽  
Inverse Design ◽  
Light Sources ◽  
Gradient Descent Method ◽  
Optical Elements ◽  
Structured Surfaces ◽  
Sensing Applications ◽  
On Chip

AbstractDesigned or patterned structured surfaces, metasurfaces, enable the miniaturization of complex arrangements of optical elements on a plane. Most of the existing literature focuses on miniaturizing the optical detection; little attention is directed to on-chip optical excitation. In this work, we design a metasurface to create a planar integrated photonic source beam collimator for use in on-chip optofluidic sensing applications. We use an iterative inverse design approach in order to optimize the metasurface to achieve a target performance using gradient descent method. We then fabricate beam collimators and experimentally compare performance characteristics with conventional uniform binary grating-based photonic beam diffractors. The optimal design enhances the illumination power by a factor of 5. The reinforced beam is more uniform with 3 dB beam spot increased almost ~ 3 times for the same device footprint area. The design approach will be useful in on-chip applications of fluorescence imaging, Raman, and IR spectroscopy and will enable better multiplexing of light sources for high throughput biosensing.

scholarly journals Controlling the phase of optical nonlinearity with plasmonic metasurfaces

Nanophotonics ◽  
2018 ◽  
Vol 7 (6) ◽  
pp. 1013-1024 ◽  
Author(s):  
Shumei Chen ◽  
Guixin Li ◽  
Kok Wai Cheah ◽  
Thomas Zentgraf ◽  
Shuang Zhang
Keyword(s):  
Nonlinear Optical ◽  
Berry Phase ◽  
Optical Nonlinearity ◽  
Linear Optics ◽  
Optical Elements ◽  
Structured Surfaces ◽  
Harmonic Signals ◽  
Propagation Of Light ◽  
New Development ◽  
Device Applications

AbstractMetasurfaces are ultrathin structured surfaces that are capable of manipulating the propagation of light in an arbitrary manner. It has been endowed with various functionalities ranging from imaging to holography. In contrast to linear optical processes, the control of wave propagation and diffraction over nonlinear optical processes such as harmonic generations had been much more limited until recently, when the concept of metasurfaces was extended from linear optics to the nonlinear optical regime for manipulating the generation of harmonic signals in an unprecedented level. The key to this recent development lies in the local control over the phase and/or the amplitude of nonlinear polarizability. This new development has led to an array of interesting optical phenomena and nonlinear optical devices that went beyond what had been achieved with traditional nonlinear optical elements. In this review, we summarize the latest progress in controlling the local phase of nonlinearity with plasmonic metasurfaces, with a focus on nonlinear geometric Berry phase and wavefront engineering, and various device applications with nonlinear metasurfaces.

Near-field scanning optical microscopy

1986 ◽  
Vol 44 ◽  
pp. 642-643
Author(s):  
E. Betzig ◽  
A. Harootunian ◽  
M. Isaacson ◽  
A. Lewis
Keyword(s):  
Near Field ◽  
Optical Microscope ◽  
Visible Radiation ◽  
Field Methods ◽  
Optical Elements ◽  
Optical Region ◽  
Order Of Magnitude ◽  
Nondestructive Imaging ◽  
Scanning Optical Microscopy ◽  
Near Field Scanning

In general, conventional methods of optical imaging are limited in spatial resolution by either the wavelength of the radiation used or by the aberrations of the optical elements. This is true whether one uses a scanning probe or a fixed beam method. The reason for the wavelength limit of resolution is due to the far field methods of producing or detecting the radiation. If one resorts to restricting our probes to the near field optical region, then the possibility exists of obtaining spatial resolutions more than an order of magnitude smaller than the optical wavelength of the radiation used. In this paper, we will describe the principles underlying such "near field" imaging and present some preliminary results from a near field scanning optical microscope (NS0M) that uses visible radiation and is capable of resolutions comparable to an SEM. The advantage of such a technique is the possibility of completely nondestructive imaging in air at spatial resolutions of about 50nm.

Characterization of Rh/Si multilayer structure by HREM and HAADF

1992 ◽  
Vol 50 (1) ◽  
pp. 122-123
Author(s):  
Y. Cheng ◽  
J. Liu ◽  
M.B. Stearns ◽  
D.G. Steams
Keyword(s):  
Normal Incidence ◽  
High Resolution Electron Microscopy ◽  
X Rays ◽  
Beam Direction ◽  
Cross Sectional ◽  
Optical Elements ◽  
Resolution Electron ◽  
Point To Point ◽  
Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

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