Single step direct-write photomask made from bimetallic Bi/In thermal resist

2003 ◽  
Author(s):  
Glenn H. Chapman ◽  
Richard Y. Tu
Keyword(s):  
Single Step ◽  
Direct Write

Electrical Resistance of Laser Sintered Direct-Write Deposited Materials for Microelectronic Applications

2004 ◽  
Vol 1 (4) ◽  
pp. 261-268 ◽  
Author(s):  
Valery R. Marinov
Keyword(s):  
Electrical Resistance ◽  
Screen Printing ◽  
Continuous Wave ◽  
New Technology ◽  
Single Step ◽  
Direct Write ◽  
Sintering Process ◽  
Heat Treated ◽  
Via Holes ◽  
Printing Processes

The direct write technology provides an interesting opportunity for plugging blind via holes as a more precise alternative to currently used screen printing processes. This technology provides a complete, void-less filling of the via and fabrication of the interconnects extending from the via in one single step. After deposition, the material is heat treated (sintered) to densify into a highly conductive solid. Sintering is usually accomplished by laser treatment. Some aspects of this relatively new technology, especially these related to the relationships between the laser sintering process and the deposited material properties are still largely unexplored. This paper presents experimental results for the microscale electrical resistance of two silver inks deposited by a direct write method and sintered with a continuous wave Nd:YAG laser. The resistance of the deposited and sintered silver lines and the resistance of the material in the plugged via holes was mapped by the advanced micro four-point probe technique. Results showed that higher laser powers reduce significantly the resistance of the silver inks. The importance of the deposited material sinterability is also emphasized.

A Direct-Write Single-Step Positive Etch Resist for Dip-Pen Nanolithography

Small ◽  
2007 ◽  
Vol 3 (12) ◽  
pp. 2034-2037 ◽  
Author(s):  
Joseph H. Wei ◽  
David S. Ginger
Keyword(s):  
Single Step ◽  
Direct Write ◽  
Dip Pen Nanolithography

scholarly journals The rational design of a Au(I) precursor for focused electron beam induced deposition

2017 ◽  
Vol 8 ◽  
pp. 2753-2765 ◽  
Author(s):  
Ali Marashdeh ◽  
Thiadrik Tiesma ◽  
Niels J C van Velzen ◽  
Sjoerd Harder ◽  
Remco W A Havenith ◽  
...  
Keyword(s):  
Electron Beam ◽  
Rational Design ◽  
Solid Phase ◽  
Single Step ◽  
Steric Effects ◽  
Nanometer Scale ◽  
Direct Write ◽  
High Volatility ◽  
The Stability ◽  
Aurophilic Interactions

Au(I) complexes are studied as precursors for focused electron beam induced processing (FEBIP). FEBIP is an advanced direct-write technique for nanometer-scale chemical synthesis. The stability and volatility of the complexes are characterized to design an improved precursor for pure Au deposition. Aurophilic interactions are found to play a key role. The short lifetime of ClAuCO in vacuum is explained by strong, destabilizing Au–Au interactions in the solid phase. While aurophilic interactions do not affect the stability of ClAuPMe3, they leave the complex non-volatile. Comparison of crystal structures of ClAuPMe3 and MeAuPMe3 shows that Au–Au interactions are much weaker or partially even absent for the latter structure. This explains its high volatility. However, MeAuPMe3 dissociates unfavorably during FEBIP, making it an unsuitable precursor. The study shows that Me groups reduce aurophilic interactions, compared to Cl groups, which we attribute to electronic rather than steric effects. Therefore we propose MeAuCO as a potential FEBIP precursor. It is expected to have weak Au–Au interactions, making it volatile. It is stable enough to act as a volatile source for Au deposition, being stabilized by 6.5 kcal/mol. Finally, MeAuCO is likely to dissociate in a single step to pure Au.

scholarly journals Branched High Aspect Ratio Nanostructures Fabricated by Focused Helium Ion Beam Induced Deposition of an Insulator

Micromachines ◽  
2021 ◽  
Vol 12 (3) ◽  
pp. 232
Author(s):  
Frances I. Allen
Keyword(s):  
Aspect Ratio ◽  
High Aspect Ratio ◽  
Ion Beam ◽  
Single Step ◽  
Direct Write ◽  
Step Method ◽  
Helium Ion ◽  
Nanofabrication Technique ◽  
Selective Placement ◽  
Branched Nanostructures

Helium ion beam induced deposition using the gaseous precursor pentamethylcyclopentasiloxane is employed to fabricate high aspect ratio insulator nanostructures (nanopillars and nanocylinders) that exhibit charge induced branching. The branched nanostructures are analyzed by transmission electron microscopy. It is found that the side branches form above a certain threshold height and that by increasing the flow rate of the precursor, the vertical growth rate and branching phenomenon can be significantly enhanced, with fractalesque branching patterns observed. The direct-write ion beam nanofabrication technique described herein offers a fast single-step method for the growth of high aspect ratio branched nanostructures with site-selective placement on the nanometer scale.

V884: Demonstration of a Novel Single-Step Percutaneous Access Sheath for Nephrostolithotomy: A Video Presentation

2005 ◽  
Vol 173 (4S) ◽  
pp. 240-240
Author(s):  
Premal J. Desai ◽  
David A. Hadley ◽  
Lincoln J. Maynes ◽  
D. Duane Baldwin
Keyword(s):  
Single Step ◽  
Video Presentation ◽  
Percutaneous Access ◽  
Access Sheath

ELECTRON BEAM DIRECT WRITE EFFECTS ON CMOS DEVICES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-291-C4-294
Author(s):  
K. BARLOW
Keyword(s):  
Electron Beam ◽  
Direct Write

Effect of Lipoprotein(a) and LDL on Plasminogen Binding to Extracellular Matrix and on Matrix-dependent Plasminogen Activation by Tissue Plasminogen Activator

1996 ◽  
Vol 75 (03) ◽  
pp. 497-502 ◽  
Author(s):  
Hadewijch L M Pekelharing ◽  
Henne A Kleinveld ◽  
Pieter F C.C.M Duif ◽  
Bonno N Bouma ◽  
Herman J M van Rijn
Keyword(s):  
Extracellular Matrix ◽  
Endothelial Cells ◽  
Plasminogen Activator ◽  
Binding Sites ◽  
Umbilical Vein ◽  
Single Step ◽  
Plasminogen Activation ◽  
Structural Homology ◽  
Tissue Plasminogen ◽  
Umbilical Vein Endothelial Cells

SummaryLp(a) is an LDL-like lipoprotein plus an additional apolipoprotein apo(a). Based on the structural homology of apo(a) with plasminogen, it is hypothesized that Lp(a) interferes with fibrinolysis. Extracellular matrix (ECM) produced by human umbilical vein endothelial cells was used to study the effect of Lp(a) and LDL on plasminogen binding and activation. Both lipoproteins were isolated from the same plasma in a single step. Plasminogen bound to ECM via its lysine binding sites. Lp(a) as well as LDL were capable of competing with plasminogen binding. The degree of inhibition was dependent on the lipoprotein donor as well as the ECM donor. When Lp(a) and LDL obtained from one donor were compared, Lp(a) was always a much more potent competitor. The effect of both lipoproteins on plasminogen binding was reflected in their effect on plasminogen activation. It is speculated that Lp(a) interacts with ECM via its LDL-like lipoprotein moiety as well as via its apo(a) moiety.

Purification of Urokinase from Complex Mixtures Using Immobilized Monoclonal Antibody Against Urokinase Light Chain

1983 ◽  
Vol 49 (01) ◽  
pp. 024-027 ◽  
Author(s):  
David Vetterlein ◽  
Gary J Calton
Keyword(s):  
Monoclonal Antibody ◽  
Light Chain ◽  
Culture Media ◽  
Biological Fluids ◽  
Single Step ◽  
High Yield ◽  
Step Method ◽  
Commercial Preparation ◽  
E Coli ◽  
Tissue Culture Media

SummaryThe preparation of a monoclonal antibody (MAB) against high molecular weight (HMW) urokinase light chain (20,000 Mr) is described. This MAB was immobilized and the resulting immunosorbent was used to isolate urokinase starting with an impure commercial preparation, fresh urine, spent tissue culture media, or E. coli broth without preliminary dialysis or concentration steps. Monospecific antibodies appear to provide a rapid single step method of purifying urokinase, in high yield, from a variety of biological fluids.

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