Etching selectivity and surface profile of attenuated phase-shifting mask using CF 4 /O 2 /He inductively coupled plasma (ICP)
Keyword(s):
2001 ◽
Vol 40
(Part 1, No. 3A)
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pp. 1242-1243
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Keyword(s):
2019 ◽
High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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2010 ◽
Vol 14
(1-2)
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pp. 119-127
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High Temperature Material Processes An International Quarterly of High-Technology Plasma Processes
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1999 ◽
Vol 3
(2-3)
◽
pp. 263-267
Keyword(s):
2017 ◽
Vol 9
(5)
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2020 ◽