Onset of laser ablation in CaF 2 crystal under excimer laser irradiation

2002 ◽  
Author(s):  
Yoshizo Kawaguchi ◽  
Aiko Narazaki ◽  
Tadatake Sato ◽  
Hiroyuki Niino ◽  
Akira Yabe
Keyword(s):  
Laser Ablation ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Excimer Laser Irradiation

Fabrication of High Density Silicon Nano-Dots by Excimer Laser Irradiation on Block Copolymer Masks

2007 ◽  
Author(s):  
Dae Up Ahn ◽  
Erol Sancaktar
Keyword(s):  
Laser Ablation ◽  
Block Copolymer ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Ablation Threshold ◽  
Laser Intensity ◽  
Selective Etching ◽  
Time Duration ◽  
Excimer Laser Ablation ◽  
Excimer Laser Irradiation

We report easy and fast fabrication methods to prepare densely packed polystyrene (PS) and silicon nano-dots using one-step excimer laser irradiation on cylindrically nanopatterned block copolymer materials, without any additional selective etching steps before a non-selective etching. Preferential etching in more ultraviolet (UV)-sensitive block component, and non-selective removal of all block components allowed transferring nanopatterns in block copolymer masks to inorganic silicon substrates, when an appropriate laser intensity was used. Surface melt flows of block components, which severely undermine the initial orders of nanopatterns in a block copolymer mask, were observed at the laser intensity near the ablation threshold of the less UV-sensitive component. Thus, in order to obtain mask-image-like topographic nanopatterns on the target material surfaces, the intensity of excimer laser radiation should be sufficiently lower than the ablation threshold of the less UV-sensitive component as long as the intensity is higher than that of the more UV-sensitive component. Numerical analyses on the photothermal excimer laser ablation in binary mixture systems predicted the presence of a matrix-assisted excimer laser ablation in the less UV-sensitive component at the laser intensity lower than its ablation threshold, owing to the heat conduction from the more UV-sensitive component during the nanoscopic level of time duration.

Surface modification of inorganic solid oxides by excimer laser irradiation

1989 ◽  
Author(s):  
Kaoru Igarashi ◽  
Hideaki Saito ◽  
Tomoo Fujioka ◽  
Satoru Fujitsu ◽  
Kunihito Koumoto ◽  
...  
Keyword(s):  
Surface Modification ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Solid Oxides ◽  
Excimer Laser Irradiation

Wavelength Dependence of Excimer Laser Irradiation Effects on Ethylene-Tetrafluoroethylene Copolymer

1994 ◽  
Vol 33 (Part 1, No. 8) ◽  
pp. 4764-4768 ◽  
Author(s):  
Yuji Hamada ◽  
Shunichi Kawanishi ◽  
Masanobu Nishii ◽  
Shun'ichi Sugimoto ◽  
Tadashi Yamamoto
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Wavelength Dependence ◽  
Irradiation Effects ◽  
Excimer Laser Irradiation ◽  
Ethylene Tetrafluoroethylene

Phase Variation of Amorphous-Si and Poly-Si Thin Films with Excimer Laser Irradiation

1996 ◽  
Vol 35 (Part 2, No. 11B) ◽  
pp. L1473-L1475 ◽  
Author(s):  
Kuninori Kitahara ◽  
Katsuyuki Suga ◽  
Akito Hara ◽  
Kazuo Nakajima
Keyword(s):  
Thin Films ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Phase Variation ◽  
Excimer Laser Irradiation ◽  
Amorphous Si

Polycrystalline silicon recrystallized with excimer laser irradiation and impurity doping using ion doping method

1993 ◽  
Vol 73 (7) ◽  
pp. 3271-3275 ◽  
Author(s):  
Yutaka Miyata ◽  
Mamoru Furuta ◽  
Tatsuo Yoshioka ◽  
Tetsuya Kawamura
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Polycrystalline Silicon ◽  
Ion Doping ◽  
Impurity Doping ◽  
Excimer Laser Irradiation

Surface Alteration of Amorphous Si3N4 Films by ArF Excimer Laser Irradiation

1995 ◽  
Vol 34 (Part 2, No. 11A) ◽  
pp. L1482-L1485 ◽  
Author(s):  
Kazuo Nakamae ◽  
Kou Kurosawa ◽  
Yasuo Takigawa ◽  
Wataru Sasaki ◽  
Yasukazu Izawa ◽  
...  
Keyword(s):  
Laser Irradiation ◽  
Excimer Laser ◽  
Surface Alteration ◽  
Excimer Laser Irradiation ◽  
Arf Excimer Laser ◽  
Amorphous Si3n4

In situ excimer laser irradiation as cleaning tool for solid phase epitaxy of laser crystallized polycrystalline silicon thin films

2013 ◽  
Vol 210 (12) ◽  
pp. 2729-2735 ◽  
Author(s):  
Ingmar Höger ◽  
Thomas Schmidt ◽  
Anja Landgraf ◽  
Martin Schade ◽  
Annett Gawlik ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Irradiation ◽  
Excimer Laser ◽  
Polycrystalline Silicon ◽  
Solid Phase ◽  
Solid Phase Epitaxy ◽  
Silicon Thin Films ◽  
Excimer Laser Irradiation
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