VUV-UV multiwavelength excitation process using F 2 and KrF excimer lasers

2002 ◽  
Author(s):  
Koji Sugioka ◽  
Toshimitsu Akake ◽  
Kotaro Obata ◽  
Katsumi Midorikawa
Keyword(s):  
Excimer Lasers ◽  
Excitation Process

Deep etching of epitaxial gallium nitride film by multiwavelength excitation process using F2 and KrF excimer lasers

2005 ◽  
Vol 82 (3) ◽  
pp. 479-483 ◽  
Author(s):  
K. Obata ◽  
K. Sugioka ◽  
K. Midorikawa ◽  
T. Inamura ◽  
H. Takai
Keyword(s):  
Gallium Nitride ◽  
Nitride Film ◽  
Excimer Lasers ◽  
Excitation Process ◽  
Deep Etching ◽  
Gallium Nitride Film

Dynamics study of multiwavelength excitation process using F 2 and KrF excimer lasers

2003 ◽  
Author(s):  
Kotaro Obata ◽  
Koji Sugioka ◽  
Takahiro Inamura ◽  
Hiroshi Takai ◽  
Koichi Toyoda ◽  
...  
Keyword(s):  
Excimer Lasers ◽  
Excitation Process

Multiwavelength excitation process of fused-silica by combination of F2 and KrF excimer lasers

2001 ◽  
Author(s):  
Kotaro Obata ◽  
Koji Sugioka ◽  
Toshimitsu Akane ◽  
Naoko Aoki ◽  
Koichi Toyoda ◽  
...  
Keyword(s):  
Fused Silica ◽  
Excimer Lasers ◽  
Excitation Process

EXCIMER LASERS

1987 ◽  
Vol 48 (C7) ◽  
pp. C7-225-C7-228
Author(s):  
J.-P. GIRARDEAU-MONTAUT
Keyword(s):  
Excimer Lasers

Removal of Co-deposited Layers by Excimer Lasers

2003 ◽  
Vol 40 (12) ◽  
pp. 1019-1026 ◽  
Author(s):  
Wataru SHU ◽  
Yukio KAWAKUBO ◽  
Guang-Nan LUO ◽  
Masataka NISHI
Keyword(s):  
Excimer Lasers
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