Precise proximity correction for fabricating chirped diffraction gratings with direct-writing electron-beam lithography

2001 ◽  
Author(s):  
Masato Okano ◽  
Tsutomu Yotsuya ◽  
Yoshihiko Hirai ◽  
Hisao Kikuta ◽  
Kazuya Yamamoto
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Diffraction Gratings ◽  
Direct Writing

Proximity Correction for Fabricating a Chirped Diffraction Grating by Direct-Writing Electron-Beam Lithography

2003 ◽  
Vol 42 (Part 1, No. 9A) ◽  
pp. 5602-5606 ◽  
Author(s):  
Masato Okano ◽  
Hisao Kikuta ◽  
Yoshihiko Hirai ◽  
Kazuya Yamamoto ◽  
Tsutom Yotsuya
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Diffraction Grating ◽  
Direct Writing

Direct Writing of Patterned Ceramics Using Electron-Beam Lithography and Metallopolymer Resists

2004 ◽  
Vol 16 (3) ◽  
pp. 215-219 ◽  
Author(s):  
S. B. Clendenning ◽  
S. Aouba ◽  
M. S. Rayat ◽  
D. Grozea ◽  
J. B. Sorge ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Direct Writing

Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

1994 ◽  
Vol 33 (7) ◽  
pp. 1176 ◽  
Author(s):  
Michael Larsson ◽  
Mats Ekberg ◽  
Fredrik Nikolajeff ◽  
Sverker Hård
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Direct Writing

Optimization of electron beam dosages in direct-writing e-beam lithography for blazed diffraction gratings

2000 ◽  
Author(s):  
Hisao Kikuta ◽  
Yoshihiko Hirai ◽  
Masato Okano ◽  
Tsutomu Yotsuya ◽  
Kazuya Yamamoto
Keyword(s):  
Electron Beam ◽  
Diffraction Gratings ◽  
Direct Writing

Investigating Narrow Plasmons in Nanoparticle Arrays Fabricated Using Electron Beam Lithography.

2005 ◽  
Vol 872 ◽  
Author(s):  
Erin M. Hicks ◽  
Linda Gunnarrsson ◽  
Tomas Rindevicius ◽  
Shengli Zou ◽  
Bengt Kasemo ◽  
...  
Keyword(s):  
Electron Beam ◽  
Plasmon Resonance ◽  
Electron Beam Lithography ◽  
Driving Forces ◽  
Dark Field ◽  
Circular Cylinders ◽  
Direct Writing ◽  
Precise Control ◽  
Wide Range ◽  
Array Structures

AbstractThe improvement of nanofabrication is one of the driving forces behind advancements in the fields of electronics, photonics and sensors. Precise control over nanoscale architecture is an essential aspect in relating new size-dependent material properties. Direct writing methods such as Electron Beam Lithography (EBL), enable precise “user-defined” writing of nanostructures in a wide range of materials. Using electrodynamics calculations, Schatz and coworkers have discovered one dimensional array structures built from spherical silver nanoparticles that produce remarkably narrow plasmon resonance spectra upon irradiation with light that is polarized perpendicularly to the array axis. In order to investigate these interactions, precise control of nanoparticle orientation, size, shape and spacing is necessary. If the overall structures have excessive defects then the effect may not be seen. To have the best control over array fabrication and to look at these interactions experimentally, EBL was used to construct lines of circular cylinders of varying interparticle spacings. Dark field microscopy was used to look at overall sample homogeneity and collect the single particle plasmon resonance spectrum. Additionally, a UV-visible spectrometer with a variable angle stage was used to look at the bulk line properties. With experimental verification of the theory will lead to not only a more thorough understanding of the underlying principles of nanophotonics, but also application in biosensing, that potentially improve on current technologies.

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