High-power XeCl laser system MELS-4k with a 25X25-cm output aperture

2001 ◽  
Author(s):  
Valery F. Losev ◽  
Nikolai G. Ivanov ◽  
Yury N. Panchenko ◽  
Arkadi G. Yastremsky
Keyword(s):  
High Power ◽  
Laser System ◽  
Xecl Laser

Experimental results on silicon annealing by a long-pulse high-power XeCl laser system

2000 ◽  
Author(s):  
Daniele Murra ◽  
Sarah Bollanti ◽  
Francesca Bonfigli ◽  
D. Della Sala ◽  
Paolo Di Lazzaro ◽  
...  
Keyword(s):  
High Power ◽  
Laser System ◽  
Experimental Results ◽  
Xecl Laser ◽  
Long Pulse

Compact high power Raman laser system using phase-modulated sidebands amplified by a single tapered amplifier

CPEM 2010 ◽  
2010 ◽  
Author(s):  
K. S. Lee ◽  
S. E. Park ◽  
T. Y. Kwon ◽  
S. B. Lee ◽  
J. Kim
Keyword(s):  
High Power ◽  
Laser System ◽  
Raman Laser

ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application

2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau
Keyword(s):  
High Power ◽  
High Surface ◽  
Laser System ◽  
Damage Threshold ◽  
Atomic Layer ◽  
Intensity Difference ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Applications ◽  
Laser Induced Damage

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.

scholarly journals Versatile, high-power 460 nm laser system for Rydberg excitation of ultracold potassium

2017 ◽  
Vol 25 (13) ◽  
pp. 14829 ◽  
Author(s):  
Alda Arias ◽  
Stephan Helmrich ◽  
Christoph Schweiger ◽  
Lynton Ardizzone ◽  
Graham Lochead ◽  
...  
Keyword(s):  
High Power ◽  
Laser System

A High Power CH 3 OH Laser System Using Stark Stabilized CO 2 Pump Lasers

1988 ◽  
Author(s):  
D. P. Hutchinson ◽  
C. A. Bennett ◽  
J. Lee ◽  
L. K. Fl etcher ◽  
C. H. Ma ◽  
...  
Keyword(s):  
High Power ◽  
Laser System ◽  
Pump Lasers

scholarly journals A High-Power Tunable Short-Pulse XeCl Laser

1986 ◽  
Vol 14 (1) ◽  
pp. 41-47
Author(s):  
Akihiko TAHAHASHI ◽  
Osamu MATSUMOTO ◽  
Mitsuo MAEDA
Keyword(s):  
High Power ◽  
Short Pulse ◽  
Xecl Laser

High power 120W ArF immersion XLR laser system for high dose applications

2013 ◽  
Author(s):  
R. Rokitski ◽  
R. Rafac ◽  
J. Melchior ◽  
R. Dubi ◽  
J. Thornes ◽  
...  
Keyword(s):  
High Power ◽  
Laser System ◽  
High Dose

scholarly journals Active Stabilization of the Beam Pointing of a High- Power KrF Laser System

2015 ◽  
Vol 22 (1) ◽  
pp. 165-172 ◽  
Author(s):  
A. Barna ◽  
I. B. Földes ◽  
J. Bohus ◽  
S. Szatmári
Keyword(s):  
High Power ◽  
Laser System ◽  
Spot Size ◽  
Electric Signal ◽  
Simple Arrangement ◽  
Krf Laser ◽  
Active Stabilization ◽  
Directional Change ◽  
Position Sensitive Detectors

Abstract An active beam-pointing stabilization system has been developed for a high-power KrF laser system to eliminate the long-term drift of the directional change of the beam in order to have a stable focusing to a high intensity. The control of the beam direction was achieved by a motor-driven mirror activated by an electric signal obtained by monitoring the position of the focus of the output beam. Instead of large sized UV-sensitive position sensitive detectors a simple arrangement with scatter plates and photodiodes are used to measure the directionality of the beam. After the beam stabilization the long-term residual deviation of the laser shots is ~14 μrad, which is comparable to the shot-to-shot variation of the beam (~12 μrad). This deviation is small enough to keep the focal spot size in a micrometer range when tightly focusing the beam using off-axis parabolic mirrors.

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