<title>Design, fabrication, and characterization of broadband multilayer mirrors for EUV optics at normal incidence</title>

Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth

Applied Physics A ◽

10.1007/s003390000723 ◽

2001 ◽

Vol 72 (1) ◽

pp. 121-124 ◽

Cited By ~ 39

Author(s):

Y.C. Lim ◽

T. Westerwalbesloh ◽

A. Aschentrup ◽

O. Wehmeyer ◽

G. Haindl ◽

...

Keyword(s):

Multilayer Mirrors ◽

Spectral Reflection ◽

Fabrication And Characterization

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Fabrication and characterization of Sb/B4C multilayer mirrors for soft X-rays

Applied Surface Science ◽

10.1016/j.apsusc.2014.04.038 ◽

2014 ◽

Vol 307 ◽

pp. 360-364 ◽

Cited By ~ 7

Author(s):

I.A. Kopylets ◽

V.V. Kondratenko ◽

E.N. Zubarev ◽

D.L. Voronov ◽

E.M. Gullikson ◽

...

Keyword(s):

X Rays ◽

Multilayer Mirrors ◽

Fabrication And Characterization

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Fabrication and characterization of beryllium-based multilayer mirrors for soft x-rays

10.1117/12.51279 ◽

1992 ◽

Cited By ~ 2

Author(s):

Judith A. Ruffner ◽

Jon M. Slaughter ◽

Patrick A. Kearney ◽

Charles M. Falco

Keyword(s):

X Rays ◽

Multilayer Mirrors ◽

Fabrication And Characterization

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Fabrication and characterization of normal-incidence p-i-n InGaAs photodetectors grown on Si substrates

10.14711/thesis-b1165772 ◽

2011 ◽

Author(s):

Yan Gao

Keyword(s):

Normal Incidence ◽

Si Substrates ◽

Fabrication And Characterization

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Characterization of imaging normal-incidence multilayer mirrors for the 40- to 300-Å range by spectroscopic techniques using a laser-plasma radiation source

10.1117/12.167387 ◽

1994 ◽

Cited By ~ 2

Author(s):

Eugene N. Ragozin ◽

Nikolai N. Kolachevsky ◽

Mikhail M. Mitropolsky ◽

Vladimir A. Slemzin ◽

Nikolai N. Salashchenko

Keyword(s):

Laser Plasma ◽

Radiation Source ◽

Normal Incidence ◽

Plasma Radiation ◽

Spectroscopic Techniques ◽

Multilayer Mirrors

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Design, fabrication and characterization of multilayer mirrors for X-ray laser

X-Ray Lasers 2004 ◽

10.1201/9781482269208-128 ◽

2005 ◽

pp. 613-618

Keyword(s):

Multilayer Mirrors ◽

X Ray ◽

Fabrication And Characterization

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Characterization of Rh/Si multilayer structure by HREM and HAADF

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100121016 ◽

1992 ◽

Vol 50 (1) ◽

pp. 122-123

Author(s):

Y. Cheng ◽

J. Liu ◽

M.B. Stearns ◽

D.G. Steams

Keyword(s):

Normal Incidence ◽

High Resolution Electron Microscopy ◽

X Rays ◽

Beam Direction ◽

Cross Sectional ◽

Optical Elements ◽

Resolution Electron ◽

Point To Point ◽

Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

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