Generation of Bessel limited-diffraction beams with hexagonal sparse arrays

2000 ◽  
Author(s):  
Nariman Majdi Nasab ◽  
Shahram Shirani ◽  
Mostafa Analoui
Keyword(s):  
1993 ◽  
Vol 28 (10) ◽  
pp. 259-270 ◽  
Author(s):  
Karel Driesen
Keyword(s):  

Author(s):  
Dongdong Zhao ◽  
Peng Chen ◽  
Yingtian Hu ◽  
Ronghua Liang ◽  
Haixia Wang ◽  
...  

2020 ◽  
Vol 68 ◽  
pp. 6402-6417
Author(s):  
Robin Rajamaki ◽  
Sundeep Prabhakar Chepuri ◽  
Visa Koivunen

2009 ◽  
Vol 89 ◽  
pp. 121-134 ◽  
Author(s):  
Shuai Zhang ◽  
Shu-Xi Gong ◽  
Ying Guan ◽  
Peng-Fei Zhang ◽  
Qi Gong

2016 ◽  
Vol 2016 ◽  
pp. 1-10 ◽  
Author(s):  
You-Feng Cheng ◽  
Wei Shao ◽  
Ran Zhang ◽  
Xiao Ding ◽  
Meng-Xia Yu

Based on an improved active element pattern (AEP) technique, a novel effective method for sidelobe suppression considering mutual coupling (MC) in planar and conformal sparse arrays is proposed in this paper. A thinning and weighting process that includes the thinning module, optimization module, and far-field calculation module is presented, and three key points, namely, the modified AEP modeling, far-field calculation of planar and conformal thinned arrays, and modified thinning strategy, are highlighted. As an effective optimization algorithm, the differential evolution algorithm (DEA) is adopted in order to achieve low sidelobe. Several numerical examples are shown to validate the consistency and effectiveness of the proposed synthesis approach. With the first use of the AEP technique for the synthesis of sparse arrays, the planar and conformal microstrip arrays with the desired array filling factor are studied to obtain the expected sidelobe level (SLL).


2021 ◽  
Author(s):  
Acacio Jose Zimbico ◽  
Fabio Kurt Schneider ◽  
Joaquim Miguel Maia ◽  
Larissa Comar Neves ◽  
Felipe Meira Ribas ◽  
...  

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