Comparison of the optical properties and UV radiation resistance of HfO 2 single layers deposited by reactive evaporation, IAD, and PIAD

Author(s):  
Roland Thielsch ◽  
Torsten Feigl ◽  
Norbert Kaiser ◽  
Sven Martin ◽  
Salvatore Scaglione ◽  
...  
1990 ◽  
Vol 58 (3) ◽  
pp. 449-461 ◽  
Author(s):  
H.G. Claycamp ◽  
M.L. McCormick ◽  
C.M. DeRose ◽  
J.H. Elwell ◽  
L.W. Oberley

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